Siliconized silsesquioxane-based nonstick molds for ultrahigh-resolution lithography

Siliconized silsesquioxane-based nonstick molds for ultrahigh-resolution lithography

A material approach to fabricating high-performance nonstick molds for manufacturing ultrahigh-resolution features (92% at 365 nm), high modulus and wide-range modulus tunability (0.757-4.192 GPa), high resistance to organic solvents (

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Bibliographische Detailangaben
Veröffentlicht in:Journal of materials chemistry 2012-01, Vol.22 (33), p.16754-16760
Hauptverfasser: Lee, Bong Kuk, Park, Kun-Sik, Kim, Dong-Pyo, Ryu, Jin-Hwa, Park, Jaehoon, Jeong, Ye-Sul, Baek, Kyu-Ha, Do, Lee-Mi
Format: Artikel
Sprache:eng
Schlagworte:
Blends
Contact angle
Lithography
Molds
Nanostructure
Polymer blends
Reproduction
Surface energy
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Beschreibung
Zusammenfassung:A material approach to fabricating high-performance nonstick molds for manufacturing ultrahigh-resolution features (92% at 365 nm), high modulus and wide-range modulus tunability (0.757-4.192 GPa), high resistance to organic solvents (
ISSN:0959-9428
1364-5501
DOI:10.1039/c2jm32386a