Improving the electrical performance of resistive switching memory using doping technology

In this paper, improvements of resistive random access memory （RRAM） using doping technology are summarized and analyzed. Based on a Cu/ZrO2/Pt device, three doping technologies with Ti ions, Cu, and Cu nanocrystal, respectively, are adopted in the experiments. Compared to an undoped device, improvements focus on four points： eliminating the electroforming process, reduc- ing operation voltage, improving electrical uniformity, and increasing device yield. In addition, thermal stability of the high re- sistance state and better retention are also achieved by the doping technology. We demonstrate that doping technology is an effec- tive way of improving the electrical performance of RRAM.