Two-Dimensional Terahertz Photonic Crystals Fabricated by Wet Chemical Etching of Silicon
The fabrication of two-dimensional terahertz photonic crystals using wet chemical etching of high-resistivity silicon is described. Wet-etched photonic crystals with a sloped sidewall were fabricated in 16 × 10 square lattices with a period of 1430 μm and a height of 150 μm, and were bonded between...
Gespeichert in:
Veröffentlicht in: | Journal of infrared, millimeter and terahertz waves millimeter and terahertz waves, 2012-02, Vol.33 (2), p.206-211 |
---|---|
Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The fabrication of two-dimensional terahertz photonic crystals using wet chemical etching of high-resistivity silicon is described. Wet-etched photonic crystals with a sloped sidewall were fabricated in 16 × 10 square lattices with a period of 1430 μm and a height of 150 μm, and were bonded between two parallel Au-coated silicon wafers for tight confinement in the vertical direction. The formation of a photonic band gap at a frequency of about 0.1 THz with a width of 14 GHz is demonstrated by the experimental results and the numerical simulations of the transmission frequency spectrum for the transverse magnetic mode. |
---|---|
ISSN: | 1866-6892 1866-6906 |
DOI: | 10.1007/s10762-011-9867-5 |