Morphology of Titanium Nanocluster Films Prepared by Gas Aggregation Cluster Source

Titanium nanocluster films were prepared using a gas aggregation cluster source based on a planar magnetron following a Haberland concept and using Ar as a working gas. The films were deposited in dependence on the argon pressure inside the cluster source and on the magnetron current. Prior to the analysis, deposited metal nanocluster films were allowed to oxidize in air at room temperature. Selected nanocluster films were annealed in air at 420 °C. The films were studied by TEM, SEM, and AFM in order to describe their morphology and topography. Crystal structure of the nanoclusters was estimated from electron diffraction patterns by SAD analysis. Chemical composition of the film surface was determined by XPS. Special attention was paid to describing the changes in the nanocluster films connected with ageing. Gas aggregation cluster source is used for deposition of titanium nanocluster films. Nanocluster size and morphology of the films depend significantly on the working gas pressure inside the cluster source chamber (working gas flow rate) and on the magnetron current. Special attention is paid to the description of oxidation of the nanoclusters and other changes in the films connected with ageing.