Formation and transformation of ZnTiO3 prepared by sputtering process

Zinc titanate (ZnTiO3) films were prepared using RF magnetron sputtering at substrate temperatures ranging from 30 to 400AC. Subsequent annealing of the as-deposited films was performed at temperatures ranging from 600 to 900AC. It was found that all as-deposited films were amorphous, as confirmed b...

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Veröffentlicht in:	Thin solid films 2010-10, Vol.518 (24), p.7366-7371
Hauptverfasser:	Lee, Ying-Chieh, Huang, Yen-Lin, Lee, Wen-His, Shieu, Fuh-Sheng
Format:	Artikel
Sprache:	eng
Schlagworte:	Annealing Crystallization Hexagonal phase Thin films Titanates Titanium dioxide Transformations Zinc
Online-Zugang:	Volltext
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