Simulation of 3D inclined/rotated UV lithography and its application to microneedles

Simulation of 3D inclined/rotated UV lithography and its application to microneedles

A 3D model is set up to simulate the exposure process of inclined/rotated UV lithography for negative SU-8 resists. The formation of inclined resist pillars and microstructures with truncated cone shapes is simulated based on a 3D exposure model in combination with a post exposure bake model for che...

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Veröffentlicht in:Optik (Stuttgart) 2012-05, Vol.123 (10), p.928-931
Hauptverfasser: Liu, Shijie, Roeder, Georg, Aygun, Gulnur, Motzek, Kristian, Evanschitzky, Peter, Erdmann, Andreas
Format: Artikel
Sprache:eng
Schlagworte:
3D simulation
Amplification
Computer simulation
Inclined and rotated exposure
Lithography
Microneedles
Microstructure
Pillars
Resists
Three dimensional
Three dimensional models
UV lithography
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Beschreibung
Zusammenfassung:A 3D model is set up to simulate the exposure process of inclined/rotated UV lithography for negative SU-8 resists. The formation of inclined resist pillars and microstructures with truncated cone shapes is simulated based on a 3D exposure model in combination with a post exposure bake model for chemically amplified resists and the Mack development model. As one of the interesting applications employing this promising lithography technique for MEMS fabrication, a solid microneedle for drug delivery is simulated.
ISSN:0030-4026
1618-1336
DOI:10.1016/j.ijleo.2011.07.007