Formation and optical properties of nanocrystalline selenium on Si substrate

We report on the formation of nanocrystalline selenium (NC-Se) on Si substrate by ultra-high vacuum physical deposition combined with rapid thermal annealing (RTA). NC-Se in a trigonal phase with an average diameter around 20 nm was formed during RTA on the amorphous selenium film at 180 °C. The NC-...

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Veröffentlicht in:Thin solid films 2011-07, Vol.519 (18), p.6102-6105
Hauptverfasser: Pan, S.W., Chen, S.Y., Li, Cheng, Huang, Wei, Lai, H.K.
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Sprache:eng
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Zusammenfassung:We report on the formation of nanocrystalline selenium (NC-Se) on Si substrate by ultra-high vacuum physical deposition combined with rapid thermal annealing (RTA). NC-Se in a trigonal phase with an average diameter around 20 nm was formed during RTA on the amorphous selenium film at 180 °C. The NC-Se exhibits a broad and strong photoluminescence at ~ 1.7 eV at room temperature. Systematic optical investigations were carried out, and the emission was ascribed to the recombination between donor- and acceptor-like states at the NC-Se/a-Se interface.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2011.04.016