Dual beam depth profiling of organic materials: Variations of analysis and sputter beam conditions

The dual beam mode of depth profiling has been used to investigate the influence of sputter beam energy, angle and sample rotation on the quality of organic depth profiles in a TOF‐SIMS instrument. The sample under investigation was a multilayer sample consisting of Irganox 3114 embedded in a Irgano...

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Veröffentlicht in:	Surface and interface analysis 2011-01, Vol.43 (1-2), p.198-200
Hauptverfasser:	Rading, D., Moellers, R., Kollmer, F., Paul, W., Niehuis, E.
Format:	Artikel
Sprache:	eng
Schlagworte:	Atomic, molecular, and ion beam impact and interactions with surfaces Beams (radiation) Bin Buckminsterfullerene C60 Chemical composition analysis, chemical depth and dopant profiling Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Depth profiling dual beam mode Electron and ion emission by liquids and solids impact phenomena Energy use Exact sciences and technology Fullerenes Impact phenomena (including electron spectra and sputtering) Interface analysis Irganox 1010 Irganox 3114 Materials science Materials testing Multilayers organic depth profiling Organic materials organic multilayer sample Physics TOF-SIMS
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Zusammenfassung:	The dual beam mode of depth profiling has been used to investigate the influence of sputter beam energy, angle and sample rotation on the quality of organic depth profiles in a TOF‐SIMS instrument. The sample under investigation was a multilayer sample consisting of Irganox 3114 embedded in a Irganox 1010 matrix provided by NPL. C60 sputter beam energies between 10 and 30 keV, and angles of 45° and 75° were used. The results are discussed with respect to depth resolution, constancy of the sputter rate and quantification possibilities. Copyright © 2010 John Wiley & Sons, Ltd.
ISSN:	0142-2421 1096-9918 1096-9918
DOI:	10.1002/sia.3422