Patterning Techniques for Metal Organic Frameworks

The tuneable pore size and architecture, chemical properties and functionalization make metal organic frameworks (MOFs) attractive versatile stimuli‐responsive materials. In this context, MOFs hold promise for industrial applications and a fervent research field is currently investigating MOF properties for device fabrication. Although the material properties have a crucial role, the ability to precisely locate the functional material is fundamental for device fabrication. In this progress report, advancements in the control of MOF positioning and precise localization of functional materials within MOF crystals are presented. Advantages and limitations of each reviewed technique are critically investigated, and several important gaps in the technological development for device fabrication are highlighted. Finally, promising patterning techniques are presented which are inspired by previous studies in organic and inorganic crystal patterning for the future of MOF lithography. Patterning metal organic frameworks (MOFs) is an emerging research field. Nano‐ and micro‐fabrication protocols applied to MOFs can offer new opportunities for device preparation based on ultra‐porous materials. Herein the different methodologies are critically reviewed, the advances and limitations for each protocol are presented, and possible new fabrication routes to master MOF positioning and functionalization are proposed.