Nano-size copper oxide encapsulated urea - formaldehyde resin film for arsenic (III) removal from aqueous solutions

The nano-size copper oxide with 40-50 nm dimensions was prepared through KNO sub(3): NaNO sub(3) eutectic melt and encapsulated in urea - formaldehyde (UF) resin during polymerisation. Particle size of CuO was determined by XRD and SEM techniques. CuO encapsulated in urea - formaldehyde resin in the...

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Veröffentlicht in:Indian journal of engineering and materials sciences 2011-10, Vol.18 (5), p.390-392
Hauptverfasser: Rastogi, R P, Singh, N B, Shukla, S K
Format: Artikel
Sprache:eng
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Zusammenfassung:The nano-size copper oxide with 40-50 nm dimensions was prepared through KNO sub(3): NaNO sub(3) eutectic melt and encapsulated in urea - formaldehyde (UF) resin during polymerisation. Particle size of CuO was determined by XRD and SEM techniques. CuO encapsulated in urea - formaldehyde resin in the form of film ( similar to 5 mm thickness) was used to remove As (III) content from aqueous solution. The process of As (III) removal was found to be efficient and cost effective.
ISSN:0971-4588