Impact of Phase Shifted Coil Currents on Plasma Uniformity

Impact of Phase Shifted Coil Currents on Plasma Uniformity

Plasma etching at sub-3x-nm nodes requires inductively coupled plasma (ICP) reactors to work within tight uniformity constraints. The characteristic donut shape of the ICPs is, however, visible on the wafer in a 20-60 mTorr range due to reduced plasma diffusion. Phase shifting of the coil currents i...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:IEEE transactions on plasma science 2011-11, Vol.39 (11), p.2516-2517
Hauptverfasser: Agarwal, A., Banna, S., Todorow, V., Rauf, S., Collins, K.
Format: Artikel
Sprache:eng
Schlagworte:
Coiling
Coils
Electric currents
Etching
Inductively coupled plasma
Inductors
Iterative closest point algorithm
Phase shift
Phase transitions
Plasma diffusion
Plasma etching
plasma modeling
Plasma physics
plasma processing
Plasma properties
plasma uniformity
Reactors
Shape
Variability
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Plasma etching at sub-3x-nm nodes requires inductively coupled plasma (ICP) reactors to work within tight uniformity constraints. The characteristic donut shape of the ICPs is, however, visible on the wafer in a 20-60 mTorr range due to reduced plasma diffusion. Phase shifting of the coil currents in an ICP source has been used to improve plasma uniformity. Images of plasma properties with and without phase shift of coil currents are presented.
ISSN:0093-3813
1939-9375
DOI:10.1109/TPS.2011.2140337