Reel-to-Reel Copper Electroplating on Pulse Laser Deposition Coated Conductor

By applying high-rate copper electroplating technique the reliable fabrication of a copper stabilizer on coated conductor with an 1 μm Ag cap is investigated. The obtained mechanical, electrical and encapsulation properties due to a 20 μm thick Cu stabilizer on the surface improve the practical and...

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Veröffentlicht in:IEEE transactions on applied superconductivity 2011-06, Vol.21 (3), p.2984-2987
Hauptverfasser: Floegel-Delor, U, Riedel, T, Wippich, D, Goebel, B, Rothfeld, R, Schirrmeister, P, Werfel, F N, Usoskin, A, Rutt, A
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Sprache:eng
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Zusammenfassung:By applying high-rate copper electroplating technique the reliable fabrication of a copper stabilizer on coated conductor with an 1 μm Ag cap is investigated. The obtained mechanical, electrical and encapsulation properties due to a 20 μm thick Cu stabilizer on the surface improve the practical and technical performance. A copper sulphate CuSO 4 based pulse plating technique is capable to deposit a 20 micrometer thick copper layer in a fast and continuous non-vacuum process. A surround Cu layer protects the HTS conductor surface against salt aqueous solutions, humidity, and against cryogenic liquids LN 2 and liquid helium. With the copper stabilizer conductor solder joining with a contact resistance of 200 nΩcm 2 becomes possible. Further effort is being made to develop and construct a high-rate and high throughput continuous reel-to-reel modular plating unit for deposition of long length ( >; 400 m). The paper describes the practical achievements within the conductor fabrication.
ISSN:1051-8223
1558-2515
DOI:10.1109/TASC.2010.2101031