Evanescent-Coupled Ge p-i-n Photodetectors on Si-Waveguide With SEG-Ge and Comparative Study of Lateral and Vertical p-i-n Configurations

Si-waveguide-integrated lateral Ge p-i-n photodetectors using novel Si/SiGe buffer and two-step Ge-process are demonstrated for the first time. Comparative analysis between lateral Ge p-i-n and vertical p-Si/i-Ge/n-Ge p-i-n is made. Light is evanescently coupled from Si waveguide to the overlaying G...

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Veröffentlicht in:IEEE electron device letters 2008-05, Vol.29 (5), p.445-448
Hauptverfasser: Wang, J., Loh, W.Y., Chua, K.T., Zang, H., Xiong, Y.Z., Loh, T.H., Yu, M.B., Lee, S.J., Guo-Qiang Lo, Kwong, D.-L.
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Sprache:eng
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Zusammenfassung:Si-waveguide-integrated lateral Ge p-i-n photodetectors using novel Si/SiGe buffer and two-step Ge-process are demonstrated for the first time. Comparative analysis between lateral Ge p-i-n and vertical p-Si/i-Ge/n-Ge p-i-n is made. Light is evanescently coupled from Si waveguide to the overlaying Ge- detector, achieving high responsivity of 1.16 A/W at 1550 nm with f 3 dB bandwidth of 3.4 GHz for lateral Ge p-i-n detector at 5 V reverse bias. In contrast, vertical p-Si/i-Ge/n-Ge p-i-n has lower responsivity of 0.29 A/W but higher bandwidth of 5.5 GHz at -5 V bias. The higher responsivity of lateral p-i-n detectors is attributed to smaller optical mode overlap with highly doped Ge region as in vertical p-i-n configuration.
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2008.920277