Sequential multiplication of dislocation sources along a crack front revealed by high-voltage electron microscopy and tomography

The three-dimensional structure of crack tip dislocations in single crystal silicon was observed by combining high-voltage electron microscopy and tomography. It was revealed that dislocations cross-slipped proximal to the crack tip even in the initial stages of plastic deformation. The local stress...

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Veröffentlicht in:Journal of materials research 2011-02, Vol.26 (4), p.508-513
Hauptverfasser: Tanaka, Masaki, Sadamatsu, Sunao, Liu, Grace S., Nakamura, Hiroto, Higashida, Kenji, Robertson, Ian M.
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Sprache:eng
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Zusammenfassung:The three-dimensional structure of crack tip dislocations in single crystal silicon was observed by combining high-voltage electron microscopy and tomography. It was revealed that dislocations cross-slipped proximal to the crack tip even in the initial stages of plastic deformation. The local stress intensity factor along the crack front was calculated by taking into account the experimentally determined dislocation character. Based on these observations and calculations, a model to account for the sequential multiplication of dislocation sources along the crack front is proposed.
ISSN:0884-2914
2044-5326
DOI:10.1557/jmr.2010.99