Soft magnetic properties and microstructure of high moment Fe-N-Al-O films for recording heads

Fe-N-Al-O alloy films were fabricated by RF reactive sputtering in a mixed Ar+N/sub 2/ plasma. The Al and O contents in films were varied by the area ratio of Al/sub 2/O/sub 3/ chips placed on an Fe target. We examined the effects of additional elements, such as Al and O, on magnetic and electrical...

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Veröffentlicht in:IEEE transactions on magnetics 2000-09, Vol.36 (5), p.3470-3472
Hauptverfasser: Ikeda, S., Uehara, Y., Tagawa, I., Takeguchi, N., Kakehi, M.
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Sprache:eng
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Zusammenfassung:Fe-N-Al-O alloy films were fabricated by RF reactive sputtering in a mixed Ar+N/sub 2/ plasma. The Al and O contents in films were varied by the area ratio of Al/sub 2/O/sub 3/ chips placed on an Fe target. We examined the effects of additional elements, such as Al and O, on magnetic and electrical properties of the Fe-N-Al-O films, and we investigated the relationship between soft magnetic properties and microstructure. The permeability reaches a maximum of about 1800, when the Al+O content range is 10-16 at%.
ISSN:0018-9464
1941-0069
DOI:10.1109/20.908863