Soft magnetic properties and microstructure of high moment Fe-N-Al-O films for recording heads
Fe-N-Al-O alloy films were fabricated by RF reactive sputtering in a mixed Ar+N/sub 2/ plasma. The Al and O contents in films were varied by the area ratio of Al/sub 2/O/sub 3/ chips placed on an Fe target. We examined the effects of additional elements, such as Al and O, on magnetic and electrical...
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Veröffentlicht in: | IEEE transactions on magnetics 2000-09, Vol.36 (5), p.3470-3472 |
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Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Fe-N-Al-O alloy films were fabricated by RF reactive sputtering in a mixed Ar+N/sub 2/ plasma. The Al and O contents in films were varied by the area ratio of Al/sub 2/O/sub 3/ chips placed on an Fe target. We examined the effects of additional elements, such as Al and O, on magnetic and electrical properties of the Fe-N-Al-O films, and we investigated the relationship between soft magnetic properties and microstructure. The permeability reaches a maximum of about 1800, when the Al+O content range is 10-16 at%. |
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ISSN: | 0018-9464 1941-0069 |
DOI: | 10.1109/20.908863 |