Analysis and design of integrated optical mirrors in planar waveguide technology

We demonstrate integrated optical mirrors in alumina-based waveguides on oxidized silicon substrates. The finite-element method (FEM) is employed for the design of mirrors operating between 1.31 and 1.55 /spl mu/m at both fundamental polarizations. Excellent agreement between measurement and simulat...

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Veröffentlicht in:	Journal of lightwave technology 2003-06, Vol.21 (6), p.1584-1591
Hauptverfasser:	Wiechmann, S., Heider, H.J., Muller, J.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Approximation Circuit properties Computer simulation Design engineering Dispersions Electric, optical and optoelectronic circuits Electronics Exact sciences and technology Finite element method Finite element methods Integrated optics Integrated optics. Optical fibers and wave guides Mathematical models Mirrors Optical and optoelectronic circuits Optical design Optical planar waveguides Optical polarization Optical scattering Optical waveguides Planar waveguides Reactive ion etching Silicon Surface roughness
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Beschreibung
Zusammenfassung:	We demonstrate integrated optical mirrors in alumina-based waveguides on oxidized silicon substrates. The finite-element method (FEM) is employed for the design of mirrors operating between 1.31 and 1.55 /spl mu/m at both fundamental polarizations. Excellent agreement between measurement and simulation is achieved for the dispersion behavior of the device. The highly polarization-dependent scattering loss at the reflecting interface is well predicted considering approximate values for the reactive ion etching (RIE) process induced surface roughness.
ISSN:	0733-8724 1558-2213
DOI:	10.1109/JLT.2003.812463