1.8 V Power Supply 16 Mb-MRAMs With 42.3% Array Efficiency
Technologies for realizing high density MRAM were developed. First, new circuitry to lower the resistance of programming wires was developed. Second, both MTJ plane shape and cross-sectional structure were optimized to lower the programming current. Based on these two technologies, 16 Mb MRAM was de...
Gespeichert in:
Veröffentlicht in: | IEEE transactions on magnetics 2006-10, Vol.42 (10), p.2724-2726 |
---|---|
Hauptverfasser: | , , , , , , , , , , , , , , , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 2726 |
---|---|
container_issue | 10 |
container_start_page | 2724 |
container_title | IEEE transactions on magnetics |
container_volume | 42 |
creator | Yoda, H. Kai, T. Inaba, T. Iwata, Y. Shimomura, N. Ikegawa, S. Tsuchida, K. Asao, Y. Kishi, T. Ueda, T. Takahashi, S. Nagamine, M. Kajiyama, T. Yoshikawa, M. Amano, M. Nagase, T. Hosotani, K. Nakayama, M. Shimizu, Y. Aikawa, H. Nishiyama, K. Kitagawa, E. Takizawa, R. Ueda, Y. Iwayama, M. Itagaki, K. |
description | Technologies for realizing high density MRAM were developed. First, new circuitry to lower the resistance of programming wires was developed. Second, both MTJ plane shape and cross-sectional structure were optimized to lower the programming current. Based on these two technologies, 16 Mb MRAM was designed, fabricated with 130 nm CMOS process and 240 nm back end MTJ process. As a result, a 1.8 V power supply MRAM with 42.3% array efficiency was successfully demonstrated |
doi_str_mv | 10.1109/TMAG.2006.880081 |
format | Article |
fullrecord | <record><control><sourceid>proquest_RIE</sourceid><recordid>TN_cdi_proquest_journals_865482392</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>1704418</ieee_id><sourcerecordid>2341519721</sourcerecordid><originalsourceid>FETCH-LOGICAL-c352t-d9c971b5a21d334d1c3625505632d6c66421edc90cc152af8666713d76d274133</originalsourceid><addsrcrecordid>eNpdkE1LAzEQhoMoWKt3wUsQiqddM_naxFsptQotilY9hjSbxS3bbk1aZP-9u7RQ8DTMzPMOw4PQNZAUgOj7-Ww4SSkhMlWKEAUnqAeaQ9JO9CnqEQIq0Vzyc3QR47JtuQDSQw-QKvyJX-tfH_D7brOpGgwSzxbJ7G04i_ir3H5jTlM2wMMQbIPHRVG60q9dc4nOCltFf3WoffTxOJ6PnpLpy-R5NJwmjgm6TXLtdAYLYSnkjPEcHJNUCCIko7l0UnIKPneaOAeC2kJJKTNgeSZzmnFgrI_u9nc3of7Z-bg1qzI6X1V27etdNBq4lCBUR97-I5f1Lqzb54ySgivKNG0hsodcqGMMvjCbUK5saAwQ06k0nUrTqTR7lW1kcLhro7NVEezalfGYU5QwxkTL3ey50nt_XGeEc1DsD2JrddY</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>865482392</pqid></control><display><type>article</type><title>1.8 V Power Supply 16 Mb-MRAMs With 42.3% Array Efficiency</title><source>IEEE Electronic Library (IEL)</source><creator>Yoda, H. ; Kai, T. ; Inaba, T. ; Iwata, Y. ; Shimomura, N. ; Ikegawa, S. ; Tsuchida, K. ; Asao, Y. ; Kishi, T. ; Ueda, T. ; Takahashi, S. ; Nagamine, M. ; Kajiyama, T. ; Yoshikawa, M. ; Amano, M. ; Nagase, T. ; Hosotani, K. ; Nakayama, M. ; Shimizu, Y. ; Aikawa, H. ; Nishiyama, K. ; Kitagawa, E. ; Takizawa, R. ; Ueda, Y. ; Iwayama, M. ; Itagaki, K.</creator><creatorcontrib>Yoda, H. ; Kai, T. ; Inaba, T. ; Iwata, Y. ; Shimomura, N. ; Ikegawa, S. ; Tsuchida, K. ; Asao, Y. ; Kishi, T. ; Ueda, T. ; Takahashi, S. ; Nagamine, M. ; Kajiyama, T. ; Yoshikawa, M. ; Amano, M. ; Nagase, T. ; Hosotani, K. ; Nakayama, M. ; Shimizu, Y. ; Aikawa, H. ; Nishiyama, K. ; Kitagawa, E. ; Takizawa, R. ; Ueda, Y. ; Iwayama, M. ; Itagaki, K.</creatorcontrib><description>Technologies for realizing high density MRAM were developed. First, new circuitry to lower the resistance of programming wires was developed. Second, both MTJ plane shape and cross-sectional structure were optimized to lower the programming current. Based on these two technologies, 16 Mb MRAM was designed, fabricated with 130 nm CMOS process and 240 nm back end MTJ process. As a result, a 1.8 V power supply MRAM with 42.3% array efficiency was successfully demonstrated</description><identifier>ISSN: 0018-9464</identifier><identifier>EISSN: 1941-0069</identifier><identifier>DOI: 10.1109/TMAG.2006.880081</identifier><identifier>CODEN: IEMGAQ</identifier><language>eng</language><publisher>New York, NY: IEEE</publisher><subject>Arrays ; Circuit simulation ; CMOS ; CMOS technology ; Cross sections ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Low voltage ; Magnetic tunnel junction (MTJ) ; Magnetic tunneling ; Magnetism ; Magnetoresistive random access memory ; magnetoresistive random access memory (MRAM) ; Materials science ; Other topics in materials science ; Physics ; Planes ; Power supplies ; Programming ; Random access memory ; Research and development ; Shape ; Switches ; Wire ; Wires</subject><ispartof>IEEE transactions on magnetics, 2006-10, Vol.42 (10), p.2724-2726</ispartof><rights>2007 INIST-CNRS</rights><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2006</rights><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c352t-d9c971b5a21d334d1c3625505632d6c66421edc90cc152af8666713d76d274133</citedby><cites>FETCH-LOGICAL-c352t-d9c971b5a21d334d1c3625505632d6c66421edc90cc152af8666713d76d274133</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/1704418$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,314,776,780,785,786,792,23909,23910,25118,27901,27902,54733</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/1704418$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=18203335$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Yoda, H.</creatorcontrib><creatorcontrib>Kai, T.</creatorcontrib><creatorcontrib>Inaba, T.</creatorcontrib><creatorcontrib>Iwata, Y.</creatorcontrib><creatorcontrib>Shimomura, N.</creatorcontrib><creatorcontrib>Ikegawa, S.</creatorcontrib><creatorcontrib>Tsuchida, K.</creatorcontrib><creatorcontrib>Asao, Y.</creatorcontrib><creatorcontrib>Kishi, T.</creatorcontrib><creatorcontrib>Ueda, T.</creatorcontrib><creatorcontrib>Takahashi, S.</creatorcontrib><creatorcontrib>Nagamine, M.</creatorcontrib><creatorcontrib>Kajiyama, T.</creatorcontrib><creatorcontrib>Yoshikawa, M.</creatorcontrib><creatorcontrib>Amano, M.</creatorcontrib><creatorcontrib>Nagase, T.</creatorcontrib><creatorcontrib>Hosotani, K.</creatorcontrib><creatorcontrib>Nakayama, M.</creatorcontrib><creatorcontrib>Shimizu, Y.</creatorcontrib><creatorcontrib>Aikawa, H.</creatorcontrib><creatorcontrib>Nishiyama, K.</creatorcontrib><creatorcontrib>Kitagawa, E.</creatorcontrib><creatorcontrib>Takizawa, R.</creatorcontrib><creatorcontrib>Ueda, Y.</creatorcontrib><creatorcontrib>Iwayama, M.</creatorcontrib><creatorcontrib>Itagaki, K.</creatorcontrib><title>1.8 V Power Supply 16 Mb-MRAMs With 42.3% Array Efficiency</title><title>IEEE transactions on magnetics</title><addtitle>TMAG</addtitle><description>Technologies for realizing high density MRAM were developed. First, new circuitry to lower the resistance of programming wires was developed. Second, both MTJ plane shape and cross-sectional structure were optimized to lower the programming current. Based on these two technologies, 16 Mb MRAM was designed, fabricated with 130 nm CMOS process and 240 nm back end MTJ process. As a result, a 1.8 V power supply MRAM with 42.3% array efficiency was successfully demonstrated</description><subject>Arrays</subject><subject>Circuit simulation</subject><subject>CMOS</subject><subject>CMOS technology</subject><subject>Cross sections</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Low voltage</subject><subject>Magnetic tunnel junction (MTJ)</subject><subject>Magnetic tunneling</subject><subject>Magnetism</subject><subject>Magnetoresistive random access memory</subject><subject>magnetoresistive random access memory (MRAM)</subject><subject>Materials science</subject><subject>Other topics in materials science</subject><subject>Physics</subject><subject>Planes</subject><subject>Power supplies</subject><subject>Programming</subject><subject>Random access memory</subject><subject>Research and development</subject><subject>Shape</subject><subject>Switches</subject><subject>Wire</subject><subject>Wires</subject><issn>0018-9464</issn><issn>1941-0069</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNpdkE1LAzEQhoMoWKt3wUsQiqddM_naxFsptQotilY9hjSbxS3bbk1aZP-9u7RQ8DTMzPMOw4PQNZAUgOj7-Ww4SSkhMlWKEAUnqAeaQ9JO9CnqEQIq0Vzyc3QR47JtuQDSQw-QKvyJX-tfH_D7brOpGgwSzxbJ7G04i_ir3H5jTlM2wMMQbIPHRVG60q9dc4nOCltFf3WoffTxOJ6PnpLpy-R5NJwmjgm6TXLtdAYLYSnkjPEcHJNUCCIko7l0UnIKPneaOAeC2kJJKTNgeSZzmnFgrI_u9nc3of7Z-bg1qzI6X1V27etdNBq4lCBUR97-I5f1Lqzb54ySgivKNG0hsodcqGMMvjCbUK5saAwQ06k0nUrTqTR7lW1kcLhro7NVEezalfGYU5QwxkTL3ey50nt_XGeEc1DsD2JrddY</recordid><startdate>20061001</startdate><enddate>20061001</enddate><creator>Yoda, H.</creator><creator>Kai, T.</creator><creator>Inaba, T.</creator><creator>Iwata, Y.</creator><creator>Shimomura, N.</creator><creator>Ikegawa, S.</creator><creator>Tsuchida, K.</creator><creator>Asao, Y.</creator><creator>Kishi, T.</creator><creator>Ueda, T.</creator><creator>Takahashi, S.</creator><creator>Nagamine, M.</creator><creator>Kajiyama, T.</creator><creator>Yoshikawa, M.</creator><creator>Amano, M.</creator><creator>Nagase, T.</creator><creator>Hosotani, K.</creator><creator>Nakayama, M.</creator><creator>Shimizu, Y.</creator><creator>Aikawa, H.</creator><creator>Nishiyama, K.</creator><creator>Kitagawa, E.</creator><creator>Takizawa, R.</creator><creator>Ueda, Y.</creator><creator>Iwayama, M.</creator><creator>Itagaki, K.</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope><scope>F28</scope><scope>FR3</scope></search><sort><creationdate>20061001</creationdate><title>1.8 V Power Supply 16 Mb-MRAMs With 42.3% Array Efficiency</title><author>Yoda, H. ; Kai, T. ; Inaba, T. ; Iwata, Y. ; Shimomura, N. ; Ikegawa, S. ; Tsuchida, K. ; Asao, Y. ; Kishi, T. ; Ueda, T. ; Takahashi, S. ; Nagamine, M. ; Kajiyama, T. ; Yoshikawa, M. ; Amano, M. ; Nagase, T. ; Hosotani, K. ; Nakayama, M. ; Shimizu, Y. ; Aikawa, H. ; Nishiyama, K. ; Kitagawa, E. ; Takizawa, R. ; Ueda, Y. ; Iwayama, M. ; Itagaki, K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c352t-d9c971b5a21d334d1c3625505632d6c66421edc90cc152af8666713d76d274133</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2006</creationdate><topic>Arrays</topic><topic>Circuit simulation</topic><topic>CMOS</topic><topic>CMOS technology</topic><topic>Cross sections</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>Low voltage</topic><topic>Magnetic tunnel junction (MTJ)</topic><topic>Magnetic tunneling</topic><topic>Magnetism</topic><topic>Magnetoresistive random access memory</topic><topic>magnetoresistive random access memory (MRAM)</topic><topic>Materials science</topic><topic>Other topics in materials science</topic><topic>Physics</topic><topic>Planes</topic><topic>Power supplies</topic><topic>Programming</topic><topic>Random access memory</topic><topic>Research and development</topic><topic>Shape</topic><topic>Switches</topic><topic>Wire</topic><topic>Wires</topic><toplevel>online_resources</toplevel><creatorcontrib>Yoda, H.</creatorcontrib><creatorcontrib>Kai, T.</creatorcontrib><creatorcontrib>Inaba, T.</creatorcontrib><creatorcontrib>Iwata, Y.</creatorcontrib><creatorcontrib>Shimomura, N.</creatorcontrib><creatorcontrib>Ikegawa, S.</creatorcontrib><creatorcontrib>Tsuchida, K.</creatorcontrib><creatorcontrib>Asao, Y.</creatorcontrib><creatorcontrib>Kishi, T.</creatorcontrib><creatorcontrib>Ueda, T.</creatorcontrib><creatorcontrib>Takahashi, S.</creatorcontrib><creatorcontrib>Nagamine, M.</creatorcontrib><creatorcontrib>Kajiyama, T.</creatorcontrib><creatorcontrib>Yoshikawa, M.</creatorcontrib><creatorcontrib>Amano, M.</creatorcontrib><creatorcontrib>Nagase, T.</creatorcontrib><creatorcontrib>Hosotani, K.</creatorcontrib><creatorcontrib>Nakayama, M.</creatorcontrib><creatorcontrib>Shimizu, Y.</creatorcontrib><creatorcontrib>Aikawa, H.</creatorcontrib><creatorcontrib>Nishiyama, K.</creatorcontrib><creatorcontrib>Kitagawa, E.</creatorcontrib><creatorcontrib>Takizawa, R.</creatorcontrib><creatorcontrib>Ueda, Y.</creatorcontrib><creatorcontrib>Iwayama, M.</creatorcontrib><creatorcontrib>Itagaki, K.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><jtitle>IEEE transactions on magnetics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Yoda, H.</au><au>Kai, T.</au><au>Inaba, T.</au><au>Iwata, Y.</au><au>Shimomura, N.</au><au>Ikegawa, S.</au><au>Tsuchida, K.</au><au>Asao, Y.</au><au>Kishi, T.</au><au>Ueda, T.</au><au>Takahashi, S.</au><au>Nagamine, M.</au><au>Kajiyama, T.</au><au>Yoshikawa, M.</au><au>Amano, M.</au><au>Nagase, T.</au><au>Hosotani, K.</au><au>Nakayama, M.</au><au>Shimizu, Y.</au><au>Aikawa, H.</au><au>Nishiyama, K.</au><au>Kitagawa, E.</au><au>Takizawa, R.</au><au>Ueda, Y.</au><au>Iwayama, M.</au><au>Itagaki, K.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>1.8 V Power Supply 16 Mb-MRAMs With 42.3% Array Efficiency</atitle><jtitle>IEEE transactions on magnetics</jtitle><stitle>TMAG</stitle><date>2006-10-01</date><risdate>2006</risdate><volume>42</volume><issue>10</issue><spage>2724</spage><epage>2726</epage><pages>2724-2726</pages><issn>0018-9464</issn><eissn>1941-0069</eissn><coden>IEMGAQ</coden><abstract>Technologies for realizing high density MRAM were developed. First, new circuitry to lower the resistance of programming wires was developed. Second, both MTJ plane shape and cross-sectional structure were optimized to lower the programming current. Based on these two technologies, 16 Mb MRAM was designed, fabricated with 130 nm CMOS process and 240 nm back end MTJ process. As a result, a 1.8 V power supply MRAM with 42.3% array efficiency was successfully demonstrated</abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/TMAG.2006.880081</doi><tpages>3</tpages></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | ISSN: 0018-9464 |
ispartof | IEEE transactions on magnetics, 2006-10, Vol.42 (10), p.2724-2726 |
issn | 0018-9464 1941-0069 |
language | eng |
recordid | cdi_proquest_journals_865482392 |
source | IEEE Electronic Library (IEL) |
subjects | Arrays Circuit simulation CMOS CMOS technology Cross sections Cross-disciplinary physics: materials science rheology Exact sciences and technology Low voltage Magnetic tunnel junction (MTJ) Magnetic tunneling Magnetism Magnetoresistive random access memory magnetoresistive random access memory (MRAM) Materials science Other topics in materials science Physics Planes Power supplies Programming Random access memory Research and development Shape Switches Wire Wires |
title | 1.8 V Power Supply 16 Mb-MRAMs With 42.3% Array Efficiency |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-30T15%3A41%3A40IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=1.8%20V%20Power%20Supply%2016%20Mb-MRAMs%20With%2042.3%25%20Array%20Efficiency&rft.jtitle=IEEE%20transactions%20on%20magnetics&rft.au=Yoda,%20H.&rft.date=2006-10-01&rft.volume=42&rft.issue=10&rft.spage=2724&rft.epage=2726&rft.pages=2724-2726&rft.issn=0018-9464&rft.eissn=1941-0069&rft.coden=IEMGAQ&rft_id=info:doi/10.1109/TMAG.2006.880081&rft_dat=%3Cproquest_RIE%3E2341519721%3C/proquest_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=865482392&rft_id=info:pmid/&rft_ieee_id=1704418&rfr_iscdi=true |