Composition optimization of (Hf, Ta, Zr, Cr)C high‐entropy carbides for good oxidation resistance

Oxidation resistance is crucial to the potential applications of high‐entropy carbides (HECs) at elevated temperatures. Here, we realize the exploration of (Hf, Ta, Zr, Cr)C high‐entropy carbides (HEC‐TM, TM = Hf, Zr, Ta, and Cr) with good oxidation resistance by optimizing their compositions. To be specific, 21 kinds of HEC‐xTM (x = 0–25 mol%) samples are fabricated by a high‐throughput ultrafast high‐temperature sintering technique, followed by oxidation testing at 1673 K for 30 min. Among all the HEC samples, the as‐fabricated HEC‐0Zr samples are proved to possess the best oxidation resistance with an oxidation depth of only 53 µm. Further study on isothermal oxidation kinetics demonstrates that the as‐fabricated HEC‐0Zr samples follow a linear oxidation law. The good oxidation resistance of the as‐fabricated HEC‐0Zr samples is believed to result from the (Ta, Me)2O5 phase with a low melting point, which can promote the densification of the oxide layer. This research opens up a new way for efficiently discovering new HECs for extreme applications.