Optimization of LPCVD Deposition Conditions of Silicon-Rich Silicon Nitride to Obtain Suitable Optical Properties for Photoluminescent Coating
Silicon nitride is a commonly used material for ceramic applications and in the fabrication processes of integrated circuits (ICs). It has also increased in interest from the scientific community for use as a functional coating due to its physical, mechanical, electrical, and optoelectronic properti...
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creator | Uribe González, Francisco Monfil Leyva, Karim Moreno Moreno, Mario Morales Sánchez, Alfredo Muñoz Zurita, Ana L. Luna López, José A. Carrillo López, Jesús Hernández de la Luz, José A. D. Salazar Valdez, Alma S. L. |
description | Silicon nitride is a commonly used material for ceramic applications and in the fabrication processes of integrated circuits (ICs). It has also increased in interest from the scientific community for use as a functional coating due to its physical, mechanical, electrical, and optoelectronic properties. In particular, silicon-rich silicon nitride (SRSN) has been considered in the photovoltaic industry as a down-conversion film for solar cells. In this work, SRSN films have been obtained by the Low-Pressure Chemical Vapor Deposition (LPCVD) technique at low to moderate deposition temperatures with a variation in the precursor gas pressure ratio. The SRSN films showed a wide photoluminescence (PL) in the visible region (without a high-deposition temperature or annealing process) and suitable optical properties (refractive index and absorption in the UV) to be used as photoluminescent coating on silicon solar cells. The absence of high-deposition temperatures could preserve the original structure of silicon solar cells, once the SRSN layer was applied. In addition, control of the reactive gas pressure ratio and deposition temperature showed an influence on the refractive index, the surface roughness, and the PL emission. |
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The SRSN films showed a wide photoluminescence (PL) in the visible region (without a high-deposition temperature or annealing process) and suitable optical properties (refractive index and absorption in the UV) to be used as photoluminescent coating on silicon solar cells. The absence of high-deposition temperatures could preserve the original structure of silicon solar cells, once the SRSN layer was applied. In addition, control of the reactive gas pressure ratio and deposition temperature showed an influence on the refractive index, the surface roughness, and the PL emission.</description><identifier>ISSN: 2079-6412</identifier><identifier>EISSN: 2079-6412</identifier><identifier>DOI: 10.3390/coatings14111383</identifier><language>eng</language><publisher>Basel: MDPI AG</publisher><subject>Ceramic coatings ; Chemical vapor deposition ; Coatings ; Fourier transforms ; Gas pressure ; Integrated circuits ; Low pressure ; Morphology ; Nitrides ; Optical properties ; Optimization ; Optoelectronics ; Photoluminescence ; Photovoltaic cells ; Pressure ratio ; Refractivity ; Semiconductor industry ; Silicon ; Silicon compounds ; Silicon nitride ; Silicon wafers ; Solar cells ; Spectrum analysis ; Surface roughness ; Temperature</subject><ispartof>Coatings (Basel), 2024-11, Vol.14 (11), p.1383</ispartof><rights>COPYRIGHT 2024 MDPI AG</rights><rights>2024 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). 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The SRSN films showed a wide photoluminescence (PL) in the visible region (without a high-deposition temperature or annealing process) and suitable optical properties (refractive index and absorption in the UV) to be used as photoluminescent coating on silicon solar cells. The absence of high-deposition temperatures could preserve the original structure of silicon solar cells, once the SRSN layer was applied. 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In this work, SRSN films have been obtained by the Low-Pressure Chemical Vapor Deposition (LPCVD) technique at low to moderate deposition temperatures with a variation in the precursor gas pressure ratio. The SRSN films showed a wide photoluminescence (PL) in the visible region (without a high-deposition temperature or annealing process) and suitable optical properties (refractive index and absorption in the UV) to be used as photoluminescent coating on silicon solar cells. The absence of high-deposition temperatures could preserve the original structure of silicon solar cells, once the SRSN layer was applied. 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subjects | Ceramic coatings Chemical vapor deposition Coatings Fourier transforms Gas pressure Integrated circuits Low pressure Morphology Nitrides Optical properties Optimization Optoelectronics Photoluminescence Photovoltaic cells Pressure ratio Refractivity Semiconductor industry Silicon Silicon compounds Silicon nitride Silicon wafers Solar cells Spectrum analysis Surface roughness Temperature |
title | Optimization of LPCVD Deposition Conditions of Silicon-Rich Silicon Nitride to Obtain Suitable Optical Properties for Photoluminescent Coating |
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