Emission Characteristics of a Laser-Plasma Source of Extreme Ultraviolet Radiation with Thin-Film Targets

The radiation spectra in the soft X-ray and extreme ultraviolet wavelength ranges of thin-film (0.15 μm) targets made of light materials (Si, C, Be) were studied when excited by a Nd:YAG laser pulse with a duration of 5.2 ns focused to an intensity of ~10 12 W/cm 2 . Line spectra of BeIII, BeIV, CV, and SiV ions were recorded using a spectrometer based on a multilayer X-ray mirror. A comparison with the spectra of bulk solid-state targets of the same materials is carried out. In all cases, there was a decrease in the intensity of the lines of the soft X-ray spectrum of film targets compared to monolithic ones; the decrease was, depending on the material, from several tens of percent to several times, with more than an order of magnitude less mass of the vaporized substance.