Regulating intermediate adsorption and H2O dissociation on a diatomic catalyst to promote electrocatalytic nitrate reduction to ammonia
Electrochemical conversion of nitrate (NO3−) is an efficient approach to reduce NO3− pollutants and it offers a promising alternative for sustainable NH3 synthesis. However, this process is limited by the mismatched reaction kinetics of NO3− discharge, active hydrogen (H*) formation via water dissoc...
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Veröffentlicht in: | Energy & environmental science 2024-09, Vol.17 (18), p.6717-6727 |
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Hauptverfasser: | , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Electrochemical conversion of nitrate (NO3−) is an efficient approach to reduce NO3− pollutants and it offers a promising alternative for sustainable NH3 synthesis. However, this process is limited by the mismatched reaction kinetics of NO3− discharge, active hydrogen (H*) formation via water dissociation, and stepwise hydrogenation processes. Herein, using density functional theory (DFT) calculations, we screened a library of Cu–M diatomic catalysts coordinated with a N doped carbon matrix (Cu–M–N–C, M = Fe, Co, Ni, Mn, Zn) by balancing N-containing intermediate adsorption and H2O dissociation barriers. Among these catalysts, Cu–Fe–N–C demonstrates the best performance with a NH3 yield rate of 1.22 mmol h−1 cm−2 and a high Faradaic efficiency (FE) for NH3 synthesis of 95.08% at −0.8 V vs. the reversible hydrogen electrode, in which diatomic sites facilitate the first NO3− discharge step to generate adsorbed *NO3 and lower the energy barriers of the following hydrogenation/dehydration steps. More importantly, the incorporated Fe sites could promote the H2O dissociation, providing a large supply of H* for the deep hydrogenation of N-containing intermediates. This work reveals the tunable bonding interactions of diatomic sites with multiple reactant/intermediates, offering a new avenue for rational design of highly efficient atomic-level dispersed catalysts for both NO3− abatement and NH3 synthesis. |
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ISSN: | 1754-5692 1754-5706 |
DOI: | 10.1039/d4ee02747g |