Analysis of thin film formed on Tenzan stone in abrasive process by synchrotron radiation

Tenzan stone, which is a domestic stone, has excellent weatherability with almost no aging deterioration even after several decades. However, the reasons for these characteristics have not been clarified. Therefore, surfaces polished with multiple abrasives and unpolished surfaces were analyzed using a laser microscope and Electron Probe Micro Analyzer (EPMA). Analysis using synchrotron radiation showed that this thin film material was amorphous silica with a film thickness of about 1 μm. We found that a thin film was formed on the surface of the stone during the polishing process. The presence of this amorphous silica thin film was assumed to act as a coating agent on the surface of Tenzan stone and contribute to its excellent weatherability.