Time-of-Flight-type Photoelectron Emission Microscopy with a 10.9-eV Laser

Time-of-Flight-type Photoelectron Emission Microscopy with a 10.9-eV Laser

We have developed a novel photoemission microscopy apparatus employing a vacuum ultraviolet laser. This setup combines photoemission electron microscopy (PEEM) with a time-of-flight detector, facilitating rapid visualization of electronic states in both real and momentum space. Achieving a spatial r...

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Veröffentlicht in:E-journal of surface science and nanotechnology 2024/02/17, Vol.22(2), pp.170-173
Hauptverfasser: Tsuda, Shunsuke, Yaji, Koichiro
Format: Artikel
Sprache:eng
Schlagworte:
Electron states
Electronic property
Emission microscopy
Momentum microscope
Photoelectric emission
Photoelectrons
Photoemission spectroscopy
Single crystals
Spatial resolution
Time of flight
Ultraviolet laser
Ultraviolet lasers
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Zusammenfassung:We have developed a novel photoemission microscopy apparatus employing a vacuum ultraviolet laser. This setup combines photoemission electron microscopy (PEEM) with a time-of-flight detector, facilitating rapid visualization of electronic states in both real and momentum space. Achieving a spatial resolution of 70 nm, attributed to the PEEM lens system, we showcase the full band mapping of a Bi(111) single crystal film using angle-resolved photoemission spectroscopy within a short acquisition time.
ISSN:1348-0391
1348-0391
DOI:10.1380/ejssnt.2024-005