On-Wafer Capacitor Characterization Including Uncertainty Estimates Up to 1.0 THz
In this article, we extract the capacitance of shunt and series metal-insulator-metal capacitors from on-wafer S-parameter measurements in the WR1.0 (0.75-1.1 THz) waveguide band. These capacitors were fabricated in two different state-of-the-art terahertz semiconductor processes and measured with t...
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Veröffentlicht in: | IEEE transactions on terahertz science and technology 2024-09, Vol.14 (5), p.734-744 |
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description | In this article, we extract the capacitance of shunt and series metal-insulator-metal capacitors from on-wafer S-parameter measurements in the WR1.0 (0.75-1.1 THz) waveguide band. These capacitors were fabricated in two different state-of-the-art terahertz semiconductor processes and measured with two different designs of via-stitched grounded coplanar waveguide calibration kits. We investigate the measurement uncertainty of extracting a shunt capacitance in the presence of probe positioning uncertainty, calibration kit process variation, and vector network analyzer electrical repeatability. We find that these uncertainty sources result in a large prediction interval that is 30.2% of the capacitor's value (14.9 ± 4.5 fF) at 900 GHz with the uncertainty from probe positioning as the largest contributor. This is the first time that an extensive uncertainty analysis has been performed on characterizing on-wafer devices at 1 THz. We quantify the precision of current calibration techniques and measurement equipment. |
doi_str_mv | 10.1109/TTHZ.2024.3431190 |
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These capacitors were fabricated in two different state-of-the-art terahertz semiconductor processes and measured with two different designs of via-stitched grounded coplanar waveguide calibration kits. We investigate the measurement uncertainty of extracting a shunt capacitance in the presence of probe positioning uncertainty, calibration kit process variation, and vector network analyzer electrical repeatability. We find that these uncertainty sources result in a large prediction interval that is 30.2% of the capacitor's value (14.9 ± 4.5 fF) at 900 GHz with the uncertainty from probe positioning as the largest contributor. This is the first time that an extensive uncertainty analysis has been performed on characterizing on-wafer devices at 1 THz. We quantify the precision of current calibration techniques and measurement equipment.</description><identifier>ISSN: 2156-342X</identifier><identifier>EISSN: 2156-3446</identifier><identifier>DOI: 10.1109/TTHZ.2024.3431190</identifier><identifier>CODEN: ITTSBX</identifier><language>eng</language><publisher>Piscataway: IEEE</publisher><subject>Calibration ; Capacitance ; Capacitors ; coplanar waveguide (CPW) ; Coplanar waveguides ; Frequency measurement ; indium phosphide (InP) ; Insulators ; Microwave integrated circuits ; monolithic microwave integrated circuit ; multiline thru-reflect-line (mTRL) ; Network analysers ; on-wafer ; Probes ; s-parameters ; terahertz ; Terahertz communications ; Transmission line measurements ; Uncertainty ; Uncertainty analysis ; vector network analyzer (VNA) ; WR1.0</subject><ispartof>IEEE transactions on terahertz science and technology, 2024-09, Vol.14 (5), p.734-744</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2024</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c176t-d34aa0491b4f70f4aed940f24158690f05a835b034f3dbaed7b0d9f344c1d4583</cites><orcidid>0000-0002-9603-4031 ; 0000-0002-6343-9489 ; 0000-0002-4927-7209 ; 0000-0001-8867-551X ; 0000-0001-5391-4699 ; 0000-0001-6696-0125 ; 0000-0001-5127-929X ; 0000-0002-1423-7725 ; 0000-0002-5498-1137 ; 0000-0002-8271-1505</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/10605072$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,776,780,792,27901,27902,54733</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/10605072$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Jones, Rob D.</creatorcontrib><creatorcontrib>Cheron, Jerome</creatorcontrib><creatorcontrib>Jamroz, Benjamin F.</creatorcontrib><creatorcontrib>Deal, William R.</creatorcontrib><creatorcontrib>Urteaga, Miguel</creatorcontrib><creatorcontrib>Williams, Dylan F.</creatorcontrib><creatorcontrib>Feldman, Ari D.</creatorcontrib><creatorcontrib>Aaen, Peter H.</creatorcontrib><creatorcontrib>Long, Christian J.</creatorcontrib><creatorcontrib>Orloff, Nathan D.</creatorcontrib><title>On-Wafer Capacitor Characterization Including Uncertainty Estimates Up to 1.0 THz</title><title>IEEE transactions on terahertz science and technology</title><addtitle>TTHZ</addtitle><description>In this article, we extract the capacitance of shunt and series metal-insulator-metal capacitors from on-wafer S-parameter measurements in the WR1.0 (0.75-1.1 THz) waveguide band. These capacitors were fabricated in two different state-of-the-art terahertz semiconductor processes and measured with two different designs of via-stitched grounded coplanar waveguide calibration kits. We investigate the measurement uncertainty of extracting a shunt capacitance in the presence of probe positioning uncertainty, calibration kit process variation, and vector network analyzer electrical repeatability. We find that these uncertainty sources result in a large prediction interval that is 30.2% of the capacitor's value (14.9 ± 4.5 fF) at 900 GHz with the uncertainty from probe positioning as the largest contributor. This is the first time that an extensive uncertainty analysis has been performed on characterizing on-wafer devices at 1 THz. We quantify the precision of current calibration techniques and measurement equipment.</description><subject>Calibration</subject><subject>Capacitance</subject><subject>Capacitors</subject><subject>coplanar waveguide (CPW)</subject><subject>Coplanar waveguides</subject><subject>Frequency measurement</subject><subject>indium phosphide (InP)</subject><subject>Insulators</subject><subject>Microwave integrated circuits</subject><subject>monolithic microwave integrated circuit</subject><subject>multiline thru-reflect-line (mTRL)</subject><subject>Network analysers</subject><subject>on-wafer</subject><subject>Probes</subject><subject>s-parameters</subject><subject>terahertz</subject><subject>Terahertz communications</subject><subject>Transmission line measurements</subject><subject>Uncertainty</subject><subject>Uncertainty analysis</subject><subject>vector network analyzer (VNA)</subject><subject>WR1.0</subject><issn>2156-342X</issn><issn>2156-3446</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2024</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNpNUMFKAzEQDaJgqf0AwUPA866TTTa7e5RSbaFQhC2Kl5DNJrqlZtckPbRf35QWcS7zYN6bmfcQuieQEgLVU13PP9MMMpZSRgmp4AqNMpLzhDLGr_9w9nGLJt5vIFbOaVmwEXpb2eRdGu3wVA5SdaGP6Fs6qYJ23UGGrrd4YdV213b2C6-t0i7IzoY9nvnQ_cigPV4POPSYpIDr-eEO3Ri59Xpy6WO0fpnV03myXL0ups_LRJGCh6SlTEpgFWmYKcAwqduKgckYyUtegYFcljRvgDJD2yZOiwbaykRHirQsL-kYPZ73Dq7_3WkfxKbfORtPCkogqzgvo8kxImeWcr33ThsxuPi12wsC4hSeOIUnTuGJS3hR83DWdFrrf3wOORQZPQJT6mnb</recordid><startdate>20240901</startdate><enddate>20240901</enddate><creator>Jones, Rob D.</creator><creator>Cheron, Jerome</creator><creator>Jamroz, Benjamin F.</creator><creator>Deal, William R.</creator><creator>Urteaga, Miguel</creator><creator>Williams, Dylan F.</creator><creator>Feldman, Ari D.</creator><creator>Aaen, Peter H.</creator><creator>Long, Christian J.</creator><creator>Orloff, Nathan D.</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0002-9603-4031</orcidid><orcidid>https://orcid.org/0000-0002-6343-9489</orcidid><orcidid>https://orcid.org/0000-0002-4927-7209</orcidid><orcidid>https://orcid.org/0000-0001-8867-551X</orcidid><orcidid>https://orcid.org/0000-0001-5391-4699</orcidid><orcidid>https://orcid.org/0000-0001-6696-0125</orcidid><orcidid>https://orcid.org/0000-0001-5127-929X</orcidid><orcidid>https://orcid.org/0000-0002-1423-7725</orcidid><orcidid>https://orcid.org/0000-0002-5498-1137</orcidid><orcidid>https://orcid.org/0000-0002-8271-1505</orcidid></search><sort><creationdate>20240901</creationdate><title>On-Wafer Capacitor Characterization Including Uncertainty Estimates Up to 1.0 THz</title><author>Jones, Rob D. ; Cheron, Jerome ; Jamroz, Benjamin F. ; Deal, William R. ; Urteaga, Miguel ; Williams, Dylan F. ; Feldman, Ari D. ; Aaen, Peter H. ; Long, Christian J. ; Orloff, Nathan D.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c176t-d34aa0491b4f70f4aed940f24158690f05a835b034f3dbaed7b0d9f344c1d4583</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2024</creationdate><topic>Calibration</topic><topic>Capacitance</topic><topic>Capacitors</topic><topic>coplanar waveguide (CPW)</topic><topic>Coplanar waveguides</topic><topic>Frequency measurement</topic><topic>indium phosphide (InP)</topic><topic>Insulators</topic><topic>Microwave integrated circuits</topic><topic>monolithic microwave integrated circuit</topic><topic>multiline thru-reflect-line (mTRL)</topic><topic>Network analysers</topic><topic>on-wafer</topic><topic>Probes</topic><topic>s-parameters</topic><topic>terahertz</topic><topic>Terahertz communications</topic><topic>Transmission line measurements</topic><topic>Uncertainty</topic><topic>Uncertainty analysis</topic><topic>vector network analyzer (VNA)</topic><topic>WR1.0</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Jones, Rob D.</creatorcontrib><creatorcontrib>Cheron, Jerome</creatorcontrib><creatorcontrib>Jamroz, Benjamin F.</creatorcontrib><creatorcontrib>Deal, William R.</creatorcontrib><creatorcontrib>Urteaga, Miguel</creatorcontrib><creatorcontrib>Williams, Dylan F.</creatorcontrib><creatorcontrib>Feldman, Ari D.</creatorcontrib><creatorcontrib>Aaen, Peter H.</creatorcontrib><creatorcontrib>Long, Christian J.</creatorcontrib><creatorcontrib>Orloff, Nathan D.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE transactions on terahertz science and technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Jones, Rob D.</au><au>Cheron, Jerome</au><au>Jamroz, Benjamin F.</au><au>Deal, William R.</au><au>Urteaga, Miguel</au><au>Williams, Dylan F.</au><au>Feldman, Ari D.</au><au>Aaen, Peter H.</au><au>Long, Christian J.</au><au>Orloff, Nathan D.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>On-Wafer Capacitor Characterization Including Uncertainty Estimates Up to 1.0 THz</atitle><jtitle>IEEE transactions on terahertz science and technology</jtitle><stitle>TTHZ</stitle><date>2024-09-01</date><risdate>2024</risdate><volume>14</volume><issue>5</issue><spage>734</spage><epage>744</epage><pages>734-744</pages><issn>2156-342X</issn><eissn>2156-3446</eissn><coden>ITTSBX</coden><abstract>In this article, we extract the capacitance of shunt and series metal-insulator-metal capacitors from on-wafer S-parameter measurements in the WR1.0 (0.75-1.1 THz) waveguide band. These capacitors were fabricated in two different state-of-the-art terahertz semiconductor processes and measured with two different designs of via-stitched grounded coplanar waveguide calibration kits. We investigate the measurement uncertainty of extracting a shunt capacitance in the presence of probe positioning uncertainty, calibration kit process variation, and vector network analyzer electrical repeatability. We find that these uncertainty sources result in a large prediction interval that is 30.2% of the capacitor's value (14.9 ± 4.5 fF) at 900 GHz with the uncertainty from probe positioning as the largest contributor. This is the first time that an extensive uncertainty analysis has been performed on characterizing on-wafer devices at 1 THz. 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subjects | Calibration Capacitance Capacitors coplanar waveguide (CPW) Coplanar waveguides Frequency measurement indium phosphide (InP) Insulators Microwave integrated circuits monolithic microwave integrated circuit multiline thru-reflect-line (mTRL) Network analysers on-wafer Probes s-parameters terahertz Terahertz communications Transmission line measurements Uncertainty Uncertainty analysis vector network analyzer (VNA) WR1.0 |
title | On-Wafer Capacitor Characterization Including Uncertainty Estimates Up to 1.0 THz |
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