On-Wafer Capacitor Characterization Including Uncertainty Estimates Up to 1.0 THz

In this article, we extract the capacitance of shunt and series metal-insulator-metal capacitors from on-wafer S-parameter measurements in the WR1.0 (0.75-1.1 THz) waveguide band. These capacitors were fabricated in two different state-of-the-art terahertz semiconductor processes and measured with t...

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Veröffentlicht in:IEEE transactions on terahertz science and technology 2024-09, Vol.14 (5), p.734-744
Hauptverfasser: Jones, Rob D., Cheron, Jerome, Jamroz, Benjamin F., Deal, William R., Urteaga, Miguel, Williams, Dylan F., Feldman, Ari D., Aaen, Peter H., Long, Christian J., Orloff, Nathan D.
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Sprache:eng
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Zusammenfassung:In this article, we extract the capacitance of shunt and series metal-insulator-metal capacitors from on-wafer S-parameter measurements in the WR1.0 (0.75-1.1 THz) waveguide band. These capacitors were fabricated in two different state-of-the-art terahertz semiconductor processes and measured with two different designs of via-stitched grounded coplanar waveguide calibration kits. We investigate the measurement uncertainty of extracting a shunt capacitance in the presence of probe positioning uncertainty, calibration kit process variation, and vector network analyzer electrical repeatability. We find that these uncertainty sources result in a large prediction interval that is 30.2% of the capacitor's value (14.9 ± 4.5 fF) at 900 GHz with the uncertainty from probe positioning as the largest contributor. This is the first time that an extensive uncertainty analysis has been performed on characterizing on-wafer devices at 1 THz. We quantify the precision of current calibration techniques and measurement equipment.
ISSN:2156-342X
2156-3446
DOI:10.1109/TTHZ.2024.3431190