Effects of CZT Substrate Surface Treatment on IR-Transmittance in the Annealing Process
The application of CdZnTe(CZT) crystals in infrared focal plane detectors and x-ray imaging detectors is hindered by the low infrared transmittance (IRT) and the presence of Cd/Te inclusions/precipitation. Over the preceding decades, strategies involving Cd vapor control during the growth process an...
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Veröffentlicht in: | Journal of electronic materials 2024-10, Vol.53 (10), p.6333-6339 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The application of CdZnTe(CZT) crystals in infrared focal plane detectors and x-ray imaging detectors is hindered by the low infrared transmittance (IRT) and the presence of Cd/Te inclusions/precipitation. Over the preceding decades, strategies involving Cd vapor control during the growth process and substrate post-annealing have been posited to address these challenges. Presently, the prioritized approach is the utilization of substrate post-annealing, owing to the limited precision in comprehending the Cd-Te equilibrium and the intricacies associated with Cd vapor control technology. This study delves into the effect of the removed surface layer depth of a CZT and the selection of the (111) A-face or (111) B-face on IRT during Cd atmosphere annealing. It is recommended that a minimum of 60
μ
m of the surface layer be eliminated using chemical mechanical polishing technology before annealing. Experimental findings further reveal that Cd atom diffusion from the (111) A-face results in an IRT enhancement of up to 60%, in stark contrast to the slight improvement observed with the (111) B-face after annealing. The mechanism of Cd atom diffusions affecting the IRT in the annealing process is discussed. |
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ISSN: | 0361-5235 1543-186X |
DOI: | 10.1007/s11664-024-11315-2 |