Formation and characterization of Ag2La thin films designed for high k-dielectric and terahertz applications

Herein two stacked nanosheets of lanthanum and silver coated by the thermal evaporation technique under a vacuum pressure of 10 –5 mbar are used to form Ag 2 La compound. Ag 2 La thin films exhibited crystalline orthorhombic structure with lattice parameters, crystallite sizes and defect densities o...

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Veröffentlicht in:Optical and quantum electronics 2024-08, Vol.56 (9), Article 1446
Hauptverfasser: Qasrawi, A. F., Zakarneh, Wafaa Ahmad
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Sprache:eng
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Zusammenfassung:Herein two stacked nanosheets of lanthanum and silver coated by the thermal evaporation technique under a vacuum pressure of 10 –5 mbar are used to form Ag 2 La compound. Ag 2 La thin films exhibited crystalline orthorhombic structure with lattice parameters, crystallite sizes and defect densities of a  = 6.670 Å, b  = 10.386 Å, c  = 7.485 Å, 29 nm and 3.99 × 10 11 lines/cm 2 , respectively. The films showed an indirect band gap of 3.25 eV. The band gap contained energy band tails of widths of 0.75 eV. In addition, the dielectric dispersion analyses on the Ag 2 La film have shown their excellent performance as high k dielectric materials displaying high dielectric constant value of 9.5 at incident light energy of 2.12 eV. On the other hand the optical conductivity and terahertz cutoff frequency spectral analyses have shown that Ag 2 La films have potentials applications in terahertz technology. The terahertz cutoff frequency varied in the range of 2–9 THz based on the driving light signal energy. As optical resonators they showed high sensitivity to visible and ultraviolet light signals. A respective high drift mobility of ~ 1.5 cm 2 /Vs and 44 cm 2 /Vs are estimated for the semitransparent Ag 2 La terahertz optical filters. The simplicity of producing Ag 2 La compound, the high dielectric constant values and the semiconducting characteristics of this compound make it attractive for high k -dielectric devices and for terahertz technology applications.
ISSN:1572-817X
0306-8919
1572-817X
DOI:10.1007/s11082-024-07337-z