Chemical vapor deposition of hexagonal boron nitride on germanium from borazine

The growth of hexagonal boron nitride (hBN) directly onto semiconducting substrates, like Ge and Ge on Si, promises to advance the integration of hBN into microelectronics. However, a detailed understanding of the growth and characteristics of hBN islands and monolayers on these substrates is lacking. Here, we present the growth of hBN on Ge and Ge epilayers on Si via high-vacuum chemical vapor deposition from borazine and study the effects of Ge sublimation, surface orientation, and vicinality on the shape and alignment of hBN islands. We find that suppressing Ge sublimation is essential for growing high quality hBN and that the Ge surface orientation and vicinality strongly affect hBN alignment. Interestingly, 95% of hBN islands are unidirectionally aligned on Ge(111), which may be a path toward metal- and transfer-free, single-crystalline hBN. Finally, we extend the growth time and borazine partial pressure to grow monolayer hBN on Ge and Ge epilayers on Si. These findings provide new insights into the growth of high-quality hBN on semiconducting substrates. hBN is deposited onto semiconducting substrates with control over the domain alignment (including close-to-unidirectional alignment) and monolayer quality.