Fluid Simulation over a Rotating Disk: Momentum and Mass Transfer across the Wafer Boundary

This research focuses on the crucial task of identifying the viscous sublayer in improving wet cleaning processes. Computational fluid dynamics (CFD) is employed to manipulate fluid properties and process parameters for optimizing cleaning efficiency. The research findings encompass the evolution of...

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Veröffentlicht in:Solid state phenomena 2023-08, Vol.346, p.231-235
Hauptverfasser: Sato, Masanobu, Belmiloud, Naser, Okuno, Yasutoshi
Format: Artikel
Sprache:eng
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Zusammenfassung:This research focuses on the crucial task of identifying the viscous sublayer in improving wet cleaning processes. Computational fluid dynamics (CFD) is employed to manipulate fluid properties and process parameters for optimizing cleaning efficiency. The research findings encompass the evolution of thickness across the wafer radius, characterization of the wavy air-liquid interface, velocity profile within the liquid, and measurement of the viscous sublayer's thickness. Key findings highlight the significance of small-scale turbulent structures, the competition between Coriolis and viscous forces, and the successful utilization of CFD LES (Large Eddy Simulation) for quantifying and visualizing the viscous sublayer and eddy flow.
ISSN:1012-0394
1662-9779
1662-9779
DOI:10.4028/p-7hsyuJ