Surfacing of Ti-Al System Mechanocomposites by Magnetron Deposition
The investigations of (Ti + Al)-SiO2 surfacing by magnetron deposition are presented in this article. The correlation between film`s thickness deposited on the particles by mechanocomposites and magnetron sputtering time was established. It was determined that the rational time for surfacing by Ti-A...
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| Veröffentlicht in: | Diffusion and defect data. Solid state data. Pt. A, Defect and diffusion forum Defect and diffusion forum, 2021-08, Vol.410, p.353-358 |
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| container_title | Diffusion and defect data. Solid state data. Pt. A, Defect and diffusion forum |
| container_volume | 410 |
| creator | Sitnikov, Alexander A. Popova, Anastasia A. Yakovlev, Vladimir I. |
| description | The investigations of (Ti + Al)-SiO2 surfacing by magnetron deposition are presented in this article. The correlation between film`s thickness deposited on the particles by mechanocomposites and magnetron sputtering time was established. It was determined that the rational time for surfacing by Ti-Al mechanocomposites system is about 40 minutes. According that deposition time the thickness of deposited SiO2 films were obtained as 5.2 microns. |
| doi_str_mv | 10.4028/www.scientific.net/DDF.410.353 |
| format | Article |
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The correlation between film`s thickness deposited on the particles by mechanocomposites and magnetron sputtering time was established. It was determined that the rational time for surfacing by Ti-Al mechanocomposites system is about 40 minutes. According that deposition time the thickness of deposited SiO2 films were obtained as 5.2 microns.</description><identifier>ISSN: 1012-0386</identifier><identifier>ISSN: 1662-9507</identifier><identifier>EISSN: 1662-9507</identifier><identifier>DOI: 10.4028/www.scientific.net/DDF.410.353</identifier><language>eng</language><publisher>Zurich: Trans Tech Publications Ltd</publisher><subject>Aluminum ; Deposition ; Magnetron sputtering ; Silicon dioxide ; Surfacing ; Thickness ; Titanium</subject><ispartof>Diffusion and defect data. Solid state data. Pt. 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According that deposition time the thickness of deposited SiO2 films were obtained as 5.2 microns.</description><subject>Aluminum</subject><subject>Deposition</subject><subject>Magnetron sputtering</subject><subject>Silicon dioxide</subject><subject>Surfacing</subject><subject>Thickness</subject><subject>Titanium</subject><issn>1012-0386</issn><issn>1662-9507</issn><issn>1662-9507</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><recordid>eNqNkE1LAzEQhoMoWKv_YUHwtttkk-wmF7H0Q4UWD63nkM0mbUqb1GRL6b83WqFXTzPMDM_LPAA8IVgQWLLB8XgsorLaddZYVTjdDcbjaUHSHlN8BXqoqsqcU1hfpx6iMoeYVbfgLsYNhBgxRHpgtDgEI5V1q8ybbGnz4TZbnGKnd9lcq7V0Xvnd3kfb6Zg1p2wuVykoeJeN9e_YencPbozcRv3wV_vgczpZjt7y2cfr-2g4y1WJIM6Z4ZWmHGEieasqImHdNkbikvGGIElbVde65VzhikliaqNkRVnJNaJ106IW98HjmbsP_uugYyc2_hBcihQYckQJwQSnq-fzlQo-xqCN2Ae7k-EkEBQ_4kQSJy7iRPpHJHEiiRNJXAK8nAFdkC6ZUOtLzj8R3_q4fzg</recordid><startdate>20210817</startdate><enddate>20210817</enddate><creator>Sitnikov, Alexander A.</creator><creator>Popova, Anastasia A.</creator><creator>Yakovlev, Vladimir I.</creator><general>Trans Tech Publications Ltd</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20210817</creationdate><title>Surfacing of Ti-Al System Mechanocomposites by Magnetron Deposition</title><author>Sitnikov, Alexander A. ; Popova, Anastasia A. ; Yakovlev, Vladimir I.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c2103-8f96e59134a9dc64a07dbfa3289b41a5dc77ed99c368a4f7fca65829e157bd1d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>Aluminum</topic><topic>Deposition</topic><topic>Magnetron sputtering</topic><topic>Silicon dioxide</topic><topic>Surfacing</topic><topic>Thickness</topic><topic>Titanium</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Sitnikov, Alexander A.</creatorcontrib><creatorcontrib>Popova, Anastasia A.</creatorcontrib><creatorcontrib>Yakovlev, Vladimir I.</creatorcontrib><collection>CrossRef</collection><jtitle>Diffusion and defect data. 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It was determined that the rational time for surfacing by Ti-Al mechanocomposites system is about 40 minutes. According that deposition time the thickness of deposited SiO2 films were obtained as 5.2 microns.</abstract><cop>Zurich</cop><pub>Trans Tech Publications Ltd</pub><doi>10.4028/www.scientific.net/DDF.410.353</doi><tpages>6</tpages></addata></record> |
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| ispartof | Diffusion and defect data. Solid state data. Pt. A, Defect and diffusion forum, 2021-08, Vol.410, p.353-358 |
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| subjects | Aluminum Deposition Magnetron sputtering Silicon dioxide Surfacing Thickness Titanium |
| title | Surfacing of Ti-Al System Mechanocomposites by Magnetron Deposition |
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