Surfacing of Ti-Al System Mechanocomposites by Magnetron Deposition

Surfacing of Ti-Al System Mechanocomposites by Magnetron Deposition

The investigations of (Ti + Al)-SiO2 surfacing by magnetron deposition are presented in this article. The correlation between film`s thickness deposited on the particles by mechanocomposites and magnetron sputtering time was established. It was determined that the rational time for surfacing by Ti-A...

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Veröffentlicht in:Diffusion and defect data. Solid state data. Pt. A, Defect and diffusion forum Defect and diffusion forum, 2021-08, Vol.410, p.353-358
Hauptverfasser: Sitnikov, Alexander A., Yakovlev, Vladimir I., Popova, Anastasia A.
Format: Artikel
Sprache:eng
Schlagworte:
Aluminum
Deposition
Magnetron sputtering
Silicon dioxide
Surfacing
Thickness
Titanium
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Zusammenfassung:The investigations of (Ti + Al)-SiO2 surfacing by magnetron deposition are presented in this article. The correlation between film`s thickness deposited on the particles by mechanocomposites and magnetron sputtering time was established. It was determined that the rational time for surfacing by Ti-Al mechanocomposites system is about 40 minutes. According that deposition time the thickness of deposited SiO2 films were obtained as 5.2 microns.
ISSN:1012-0386
1662-9507
1662-9507
DOI:10.4028/www.scientific.net/DDF.410.353