62‐1: High Performance OLED with Microlens Array, Metal Mask‐Less Lithography, and RGB Side‐by‐Side Patterning

This paper reports on a metal mask‐less lithography (MML) process for RGB OLED displays. By integrating MML, tandem OLEDs, and a microlens array (MLA), ultra‐high resolution, high luminance, and robust reliability can be realized. The report also demonstrates an MLA using an S‐stripe MLA pattern. Th...

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Veröffentlicht in:SID International Symposium Digest of technical papers 2024-06, Vol.55 (1), p.844-847
Hauptverfasser: Sugisawa, Nozomu, Nakamura, Daiki, Hatsumi, Ryo, Ikeda, Hisao, Nagata, Takaaki, Aoyama, Tomoya, Eguchi, Shingo, Yamane, Yasumasa, Miyairi, Hidekazu, Ishitani, Tetsuji, Matsuki, Mitsuhiro, Okazaki, Kenichi, Idojiri, Satoru, Nakazawa, Yasutaka, Yamazaki, Shunpei
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Sprache:eng
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Zusammenfassung:This paper reports on a metal mask‐less lithography (MML) process for RGB OLED displays. By integrating MML, tandem OLEDs, and a microlens array (MLA), ultra‐high resolution, high luminance, and robust reliability can be realized. The report also demonstrates an MLA using an S‐stripe MLA pattern. The prototype exhibits excellent properties, with a white light efficiency of 66.7 cd/A at 15,000 cd/m².
ISSN:0097-966X
2168-0159
DOI:10.1002/sdtp.17663