Vertically aligned interlocked tungsten oxide nanosheet thin film for photocatalytic application: effect of deposition cycles
In this work, vertically aligned interlocked tungsten oxide (WO 3 ) nanosheets are deposited on non-conducting substrates using the modified chemical solution deposition (MCSD) method. The number of deposition cycles is varied to tune the physicochemical properties of WO 3 thin films. The WO 3 thin...
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Veröffentlicht in: | Journal of materials science. Materials in electronics 2024-07, Vol.35 (20), p.1436, Article 1436 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | In this work, vertically aligned interlocked tungsten oxide (WO
3
) nanosheets are deposited on non-conducting substrates using the modified chemical solution deposition (MCSD) method. The number of deposition cycles is varied to tune the physicochemical properties of WO
3
thin films. The WO
3
thin films exhibit an orthorhombic crystal structure with a preferred orientation along the (111) plane. The WO
3
thin film shows the vertically aligned interlocked nanosheet morphology with a change in the lateral dimensions upon varying the number of deposition cycles. All the WO
3
thin films exhibited strong visible light harvesting characteristics in the 510–530 nm wavelength range. The WO
3
thin films are used for the visible-light-active photocatalytic degradation of organic molecules such as methylene blue (MB), rhodamine B (Rh B) and tetracycline hydrochloride (TC). The optimized WO
3
thin film shows maximum photocatalytic degradation performance of 92, 89 and 87% in 210 min for MB, Rh B and TC, respectively. The present study illustrates the usefulness of the MCSD approach for depositing vertically aligned interlocked WO
3
nanosheet thin films and enhancing photocatalytic performance. |
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ISSN: | 0957-4522 1573-482X |
DOI: | 10.1007/s10854-024-13184-1 |