Effect of Deposition Temperature on Optical Properties of Porous Amorphous SiC Film

To study the effect of different deposition temperatures on the optical properties of porous SiC films, single crystal Si was used as the substrate, a layer of anodic aluminum oxide (AAO) film was transferred on the Si substrate by chemical method, and then a layer of SiC was deposited on anodic alu...

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Veröffentlicht in:Journal of Wuhan University of Technology. Materials science edition 2024-08, Vol.39 (4), p.839-844
Hauptverfasser: Xu, Jixiang, Tao, Weijie, Liu, Canhui, Xu, Haoyao, Li, Lixuan, He, Zhenhua
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Sprache:eng
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Zusammenfassung:To study the effect of different deposition temperatures on the optical properties of porous SiC films, single crystal Si was used as the substrate, a layer of anodic aluminum oxide (AAO) film was transferred on the Si substrate by chemical method, and then a layer of SiC was deposited on anodic aluminum oxide (AAO) template to prepare porous fluorescent SiC film by magnetron sputtering. The deposition temperature was ranged from 373 to 873 K. The thickness of the porous SiC film coated on the AAO surface was around 283 nm. It is found that the porous SiC with the deposition temperature of 873 K has the strongest photoluminescence (PL) intensity excited by 375 nm laser. The time-resolved PL spectra prove that the PL is mainly from intrinsic light emitting of SiC. With the optimized process, porous amorphous SiC film may have potential applications in the field of warm white LEDs.
ISSN:1000-2413
1993-0437
DOI:10.1007/s11595-024-2944-0