Synthesis and Physical Properties of Thin Ni–Al Films

Synthesis and Physical Properties of Thin Ni–Al Films

Ni–Al films produced by resistive thermal evaporation using a VUP-5 vacuum station are studied. The basic stages in film synthesis are described. The wavefront velocity in synthesis is determined, along with the radial growth rate of the nuclei (islands) formed. The grain size in the surface is inve...

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Veröffentlicht in:Russian engineering research 2024, Vol.44 (4), p.537-541
Hauptverfasser: Malikov, V. N., Katasonov, A. O., Ishkov, A. V., Voinash, S. A., Zagidullin, R. R., Yakushev, A. M.
Format: Artikel
Sprache:eng
Schlagworte:
Aluminum
Electrical resistivity
Engineering
Engineering Design
Fourier analysis
Grain size
Nickel
Physical properties
Synthesis
Thin films
Vacuum thermal evaporation
Wave fronts
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Zusammenfassung:Ni–Al films produced by resistive thermal evaporation using a VUP-5 vacuum station are studied. The basic stages in film synthesis are described. The wavefront velocity in synthesis is determined, along with the radial growth rate of the nuclei (islands) formed. The grain size in the surface is investigated. Fourier analysis provides information regarding the structural properties of the surface. The electrical conductivity of the thin metallic film is determined.
ISSN:1068-798X
1934-8088
DOI:10.3103/S1068798X24700618