Surface figure correction using differential deposition of WSi\(_2\)
The surface figure of an x-ray mirror was improved by differential deposition of WSi\(_2\) layers. DC magnetron sputtering through beam-defining apertures was applied on moving substrates to generate thin films with arbitrary longitudinal thickness variations. The required velocity profiles were cal...
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Veröffentlicht in: | arXiv.org 2024-03 |
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Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The surface figure of an x-ray mirror was improved by differential deposition of WSi\(_2\) layers. DC magnetron sputtering through beam-defining apertures was applied on moving substrates to generate thin films with arbitrary longitudinal thickness variations. The required velocity profiles were calculated using a deconvolution algorithm. Height errors were evaluated after each correction iteration using offline visible light surface metrology. WSi\(_2\) was selected as a promising material since it conserves the initial substrate surface roughness and limits the film stress to acceptable levels. On a 300 mm long flat Si mirror the shape error was reduced to less than 0.2 nm RMS. |
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ISSN: | 2331-8422 |
DOI: | 10.48550/arxiv.2403.17498 |