Surface figure correction using differential deposition of WSi\(_2\)

The surface figure of an x-ray mirror was improved by differential deposition of WSi\(_2\) layers. DC magnetron sputtering through beam-defining apertures was applied on moving substrates to generate thin films with arbitrary longitudinal thickness variations. The required velocity profiles were cal...

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Veröffentlicht in:arXiv.org 2024-03
Hauptverfasser: Morawe, Ch, Bras, P, Labouré, S, Perrin, F, Vivo, A
Format: Artikel
Sprache:eng
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Zusammenfassung:The surface figure of an x-ray mirror was improved by differential deposition of WSi\(_2\) layers. DC magnetron sputtering through beam-defining apertures was applied on moving substrates to generate thin films with arbitrary longitudinal thickness variations. The required velocity profiles were calculated using a deconvolution algorithm. Height errors were evaluated after each correction iteration using offline visible light surface metrology. WSi\(_2\) was selected as a promising material since it conserves the initial substrate surface roughness and limits the film stress to acceptable levels. On a 300 mm long flat Si mirror the shape error was reduced to less than 0.2 nm RMS.
ISSN:2331-8422
DOI:10.48550/arxiv.2403.17498