A Mo-salicylaldehyde-linker (Mo-Tp) based 2D MOF as a single-atom catalyst for the nitrogen reduction reaction
Two-dimensional (2D) materials for the electrocatalytic nitrogen reduction reaction (NRR) can offer a groundbreaking and sustainable alternative to the traditional Haber-Bosch process. Two-dimensional metal-organic frameworks (2D MOFs) have the potential to serve as single-atom catalysts (SACs), ena...
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Veröffentlicht in: | Journal of materials chemistry. A, Materials for energy and sustainability Materials for energy and sustainability, 2024-03, Vol.12 (12), p.758-766 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Two-dimensional (2D) materials for the electrocatalytic nitrogen reduction reaction (NRR) can offer a groundbreaking and sustainable alternative to the traditional Haber-Bosch process. Two-dimensional metal-organic frameworks (2D MOFs) have the potential to serve as single-atom catalysts (SACs), enabling the utilization of active metal centers up to 100% in the eNRR and also capable of reducing the HER effectively. This work outlines the screening of a new series of TM-Tp 2D MOFs (where Tp = 1,3,5-triformylphloroglucinol; TM = Cu, Ni, Cr, Mo, Os, Ru, and W) for the NRR, using density functional theory. Two screening stages based on the activation of the N
2
molecule and stabilization of the NNH intermediate showed that the Mo-Tp MOF monolayer is the most viable catalyst to be studied further. Mo-Tp shows outstanding stability and high potency towards being an efficient NRR catalyst with high selectivity. An investigation of the NRR pathway showed a limiting potential (
U
L
) of −0.38 V in the distal pathway. Furthermore, the theoretical faradaic efficiency (FE
t
) is 100% towards the NRR. Our findings show that Mo-based 2D MOFs exhibit outstanding performance as NRR catalysts.
This work investigates a Mo-Tp 2D MOF screened from a number of different transition-metal-based 2D MOFs. After exfoliation, the Mo-Tp 2D MOF produces ammonia
via
the distal pathway at a very low limiting potential of −0.38 V. |
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ISSN: | 2050-7488 2050-7496 |
DOI: | 10.1039/d3ta06666e |