On the Deposition of an FexNi1 – x Film by the Magnetron Sputtering of a Multilayer Target

The application of a technological magnetron equipped with a multilayer target for the deposition of Fe x Ni 1 – x composite permalloy films is considered. The novelty of the work is the composition of the multilayer target from Fe and Ni plates operating in the “hot” mode. It is numerically established that Fe x Ni 1 – x films with a known maximum stability of the crystal structure at 0.23 < x < 0.27 can be obtained by changing the independent parameters of the deposition process (discharge current density and area of slits in the outer plate) in relatively narrow ranges. Under these conditions, evaporation of the plates has little effect on the film growth rate. The process parameters at which the Fe 0.25 Ni 0.75 film can be obtained are interconnected by a first-order polynomial. It is established that under these conditions the film deposition rate can vary in the range (3.1–7.9) × 10 –3 µm/s. Simulation made it possible to establish that during the deposition of Fe 0.25 Ni 0.75 films, their magnetic properties can change exponentially. It is shown that deposition conditions are possible under which the magnetic properties reach steady state levels in about 200–400 s.