α-Si3N4 dendrites and whiskers fabricated using electron irradiation technology
Silicon nitride (Si3N4) has great potential for applications in photoelectric and semiconductor fields. In this study, a novel strategy of fabricating Si3N4 crystals is reported, and the morphology of α-Si3N4 can be controlled. The aBN/SiO2/Si wafers were designed and irradiated by a high-energy ele...
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Veröffentlicht in: | CrystEngComm 2024-03, Vol.26 (10), p.1464-1471 |
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Hauptverfasser: | , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Silicon nitride (Si3N4) has great potential for applications in photoelectric and semiconductor fields. In this study, a novel strategy of fabricating Si3N4 crystals is reported, and the morphology of α-Si3N4 can be controlled. The aBN/SiO2/Si wafers were designed and irradiated by a high-energy electron beam for 2 min using home-made equipment. Tree-like α-Si3N4 dendrites and [001]-oriented unbranched α-Si3N4 whiskers can be synthesized by controlling the electron beam energy. Related formation mechanisms were analyzed based on componential and structural characterization using a scanning electron microscope and high-resolution transmission electron microscope. In addition, photoluminescence measurements indicate that the synthesized α-Si3N4 exhibit unique photoluminescence properties. This is attributed to α-Si3N4 forming abundant Si–Si bonds, Si dangling bonds, N dangling bonds and oxygen bonds in the synthesis process. These findings provide new insights into fabricating high-quality Si3N4 crystals, as well as developing related high-performance micro- or nano-devices. |
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ISSN: | 1466-8033 |
DOI: | 10.1039/d3ce01235b |