Some recent topics in gold plating for electronics applications

A review is presented of selected recent topics in electrolytic and electroless gold plating for electronics applications. The topics covered include developments of non-cyanide electroplating baths for plating soft gold suitable for fabricating microbumps on silicon wafers, electroplating of hard g...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Gold Bulletin 1998-01, Vol.31 (1), p.3-13
Hauptverfasser: Okinaka, Yutaka, Hoshino, Masao
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A review is presented of selected recent topics in electrolytic and electroless gold plating for electronics applications. The topics covered include developments of non-cyanide electroplating baths for plating soft gold suitable for fabricating microbumps on silicon wafers, electroplating of hard gold and alternative materials with thermally stable electrical contact resistance and wear resistance for use on connectors exposed to elevated temperatures, and neutral, non-cyanide electroless processes for plating pure, soft gold on isolated areas of circuit boards. The development of the new electroless processes has been a subject of great interest and activity, and therefore an extensive survey of the progress in this field is included.
ISSN:0017-1557
2190-7579
DOI:10.1007/BF03215469