Modeling of Threshold Voltage and Subthreshold Current of Junctionless Channel-Modulated Dual-Material Double-Gate (JL-CM-DMDG) MOSFETs
This article presents the analytical modeling of the subthreshold drain current of junctionless channel-modulated double-material double-gate ( J L - C M - D M D G ) MOSFET. The first time under the full depletion mode, the center channel potential and threshold voltage ( V T H ) have been derived....
Gespeichert in:
Veröffentlicht in: | SILICON 2022-07, Vol.14 (10), p.5495-5502 |
---|---|
Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | This article presents the analytical modeling of the subthreshold drain current of junctionless channel-modulated double-material double-gate (
J
L
-
C
M
-
D
M
D
G
) MOSFET. The first time under the full depletion mode, the center channel potential and threshold voltage (
V
T
H
) have been derived. The center channel potential has been produced by solving the 2D Passion’s equation with ideal boundary conditions. The behavior of threshold voltage (
V
T
H
) and subthreshold drain current of the
J
L
-
C
M
-
D
M
D
G
MOSFET by varying physical device parameters such as doping concentration (
N
D
n
), channel thickness (
t
S
i
), and channel length ratio (
L
1
:
L
2
) has been examined. The drain-induced barrier-lowering (
D
I
B
L
) as an indicator of short-channel effects has been studied. The model results have been verified with simulation data extracted from a 2D ATLAS TCAD simulator. |
---|---|
ISSN: | 1876-990X 1876-9918 |
DOI: | 10.1007/s12633-021-01327-6 |