C60-containing polymers for electron beam lithography

New C 60 -containing polymers were synthesized for electron beam lithography. The homo and random copolymers of p -chloromethylstyrene and p - tert -butoxystyrene were produced using a nitroxide-mediated living radical polymerization technique, and then the C 60 -containing polymers were obtained by...

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Veröffentlicht in:	Polymer bulletin (Berlin, Germany) Germany), 2014, Vol.71 (9), p.2395-2405
Hauptverfasser:	Okamura, Haruyuki, Forman, Drew C., Ober, Christopher K.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Characterization and Evaluation of Materials Chemistry Chemistry and Materials Science Complex Fluids and Microfluidics Copolymers Electron beam lithography Exact sciences and technology Molecular weight Organic Chemistry Organic polymers Original Paper Physical Chemistry Physicochemistry of polymers Polymer Sciences Polymerization Polymers Polymers with particular properties Preparation, kinetics, thermodynamics, mechanism and catalysts Silicon wafers Soft and Granular Matter
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