C60-containing polymers for electron beam lithography
New C 60 -containing polymers were synthesized for electron beam lithography. The homo and random copolymers of p -chloromethylstyrene and p - tert -butoxystyrene were produced using a nitroxide-mediated living radical polymerization technique, and then the C 60 -containing polymers were obtained by...
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| Veröffentlicht in: | Polymer bulletin (Berlin, Germany) Germany), 2014, Vol.71 (9), p.2395-2405 |
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| container_title | Polymer bulletin (Berlin, Germany) |
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| creator | Okamura, Haruyuki Forman, Drew C. Ober, Christopher K. |
| description | New C
60
-containing polymers were synthesized for electron beam lithography. The homo and random copolymers of
p
-chloromethylstyrene and
p
-
tert
-butoxystyrene were produced using a nitroxide-mediated living radical polymerization technique, and then the C
60
-containing polymers were obtained by the reaction of C
60
with the nitroxide-terminated polymers and the subsequent transformation of the
tert
-butoxy groups to hydroxy groups. The highly sensitive lithographic performance of the resulting electron beam resists led to the fabrication of 50-nm-feature size patterning using the C
60
-containing copolymers of
p
-chloromethylstyrene and
p
-hydroxystyrene. |
| doi_str_mv | 10.1007/s00289-014-1197-z |
| format | Article |
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60
-containing polymers were synthesized for electron beam lithography. The homo and random copolymers of
p
-chloromethylstyrene and
p
-
tert
-butoxystyrene were produced using a nitroxide-mediated living radical polymerization technique, and then the C
60
-containing polymers were obtained by the reaction of C
60
with the nitroxide-terminated polymers and the subsequent transformation of the
tert
-butoxy groups to hydroxy groups. The highly sensitive lithographic performance of the resulting electron beam resists led to the fabrication of 50-nm-feature size patterning using the C
60
-containing copolymers of
p
-chloromethylstyrene and
p
-hydroxystyrene.</description><identifier>ISSN: 0170-0839</identifier><identifier>EISSN: 1436-2449</identifier><identifier>DOI: 10.1007/s00289-014-1197-z</identifier><identifier>CODEN: POBUDR</identifier><language>eng</language><publisher>Berlin/Heidelberg: Springer Berlin Heidelberg</publisher><subject>Applied sciences ; Characterization and Evaluation of Materials ; Chemistry ; Chemistry and Materials Science ; Complex Fluids and Microfluidics ; Copolymers ; Electron beam lithography ; Exact sciences and technology ; Molecular weight ; Organic Chemistry ; Organic polymers ; Original Paper ; Physical Chemistry ; Physicochemistry of polymers ; Polymer Sciences ; Polymerization ; Polymers ; Polymers with particular properties ; Preparation, kinetics, thermodynamics, mechanism and catalysts ; Silicon wafers ; Soft and Granular Matter</subject><ispartof>Polymer bulletin (Berlin, Germany), 2014, Vol.71 (9), p.2395-2405</ispartof><rights>Springer-Verlag Berlin Heidelberg 2014</rights><rights>2015 INIST-CNRS</rights><rights>Springer-Verlag Berlin Heidelberg 2014.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c434z-d2b7473a295acdb56064f4b8ce5a05cbbdf3dc1a9f69c53e6984fbe63046419c3</citedby><cites>FETCH-LOGICAL-c434z-d2b7473a295acdb56064f4b8ce5a05cbbdf3dc1a9f69c53e6984fbe63046419c3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s00289-014-1197-z$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://www.proquest.com/docview/2918035620?pq-origsite=primo$$EHTML$$P50$$Gproquest$$H</linktohtml><link.rule.ids>314,780,784,21387,27923,27924,33743,41487,42556,43804,51318,64384,64388,72240</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=28697119$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Okamura, Haruyuki</creatorcontrib><creatorcontrib>Forman, Drew C.</creatorcontrib><creatorcontrib>Ober, Christopher K.</creatorcontrib><title>C60-containing polymers for electron beam lithography</title><title>Polymer bulletin (Berlin, Germany)</title><addtitle>Polym. Bull</addtitle><description>New C
60
-containing polymers were synthesized for electron beam lithography. The homo and random copolymers of
p
-chloromethylstyrene and
p
-
tert
-butoxystyrene were produced using a nitroxide-mediated living radical polymerization technique, and then the C
60
-containing polymers were obtained by the reaction of C
60
with the nitroxide-terminated polymers and the subsequent transformation of the
tert
-butoxy groups to hydroxy groups. The highly sensitive lithographic performance of the resulting electron beam resists led to the fabrication of 50-nm-feature size patterning using the C
60
-containing copolymers of
p
-chloromethylstyrene and
p
-hydroxystyrene.</description><subject>Applied sciences</subject><subject>Characterization and Evaluation of Materials</subject><subject>Chemistry</subject><subject>Chemistry and Materials Science</subject><subject>Complex Fluids and Microfluidics</subject><subject>Copolymers</subject><subject>Electron beam lithography</subject><subject>Exact sciences and technology</subject><subject>Molecular weight</subject><subject>Organic Chemistry</subject><subject>Organic polymers</subject><subject>Original Paper</subject><subject>Physical Chemistry</subject><subject>Physicochemistry of polymers</subject><subject>Polymer Sciences</subject><subject>Polymerization</subject><subject>Polymers</subject><subject>Polymers with particular properties</subject><subject>Preparation, kinetics, thermodynamics, mechanism and catalysts</subject><subject>Silicon wafers</subject><subject>Soft and Granular Matter</subject><issn>0170-0839</issn><issn>1436-2449</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><sourceid>AFKRA</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><recordid>eNp1kE1LAzEQhoMoWKs_wNuCeIxOPja7OUrxCwpe9BySbNJu2W7WZHtof70pW_TkaRjmmXeGB6FbAg8EoHpMALSWGAjHhMgKH87QjHAmMOVcnqMZkAow1ExeoquUNpB7IcgMlQsB2IZ-1G3f9qtiCN1-62IqfIiF65wdY-gL4_S26NpxHVZRD-v9Nbrwukvu5lTn6Ovl-XPxhpcfr--LpyW2nPEDbqipeMU0laW2jSkFCO65qa0rNZTWmMazxhItvZC2ZE7ImnvjBAMuOJGWzdHdlDvE8L1zaVSbsIt9PqmoJDWwUlDIFJkoG0NK0Xk1xHar414RUEc7arKjsh11tKMOeef-lKyT1Z2Purdt-l2ktZBVRjNHJy7lUb9y8e-D_8N_AGQidGk</recordid><startdate>2014</startdate><enddate>2014</enddate><creator>Okamura, Haruyuki</creator><creator>Forman, Drew C.</creator><creator>Ober, Christopher K.</creator><general>Springer Berlin Heidelberg</general><general>Springer</general><general>Springer Nature B.V</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>AFKRA</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>HCIFZ</scope><scope>KB.</scope><scope>PDBOC</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope></search><sort><creationdate>2014</creationdate><title>C60-containing polymers for electron beam lithography</title><author>Okamura, Haruyuki ; Forman, Drew C. ; Ober, Christopher K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c434z-d2b7473a295acdb56064f4b8ce5a05cbbdf3dc1a9f69c53e6984fbe63046419c3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2014</creationdate><topic>Applied sciences</topic><topic>Characterization and Evaluation of Materials</topic><topic>Chemistry</topic><topic>Chemistry and Materials Science</topic><topic>Complex Fluids and Microfluidics</topic><topic>Copolymers</topic><topic>Electron beam lithography</topic><topic>Exact sciences and technology</topic><topic>Molecular weight</topic><topic>Organic Chemistry</topic><topic>Organic polymers</topic><topic>Original Paper</topic><topic>Physical Chemistry</topic><topic>Physicochemistry of polymers</topic><topic>Polymer Sciences</topic><topic>Polymerization</topic><topic>Polymers</topic><topic>Polymers with particular properties</topic><topic>Preparation, kinetics, thermodynamics, mechanism and catalysts</topic><topic>Silicon wafers</topic><topic>Soft and Granular Matter</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Okamura, Haruyuki</creatorcontrib><creatorcontrib>Forman, Drew C.</creatorcontrib><creatorcontrib>Ober, Christopher K.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central</collection><collection>AUTh Library subscriptions: ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central</collection><collection>SciTech Premium Collection</collection><collection>https://resources.nclive.org/materials</collection><collection>Materials Science Collection</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><jtitle>Polymer bulletin (Berlin, Germany)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Okamura, Haruyuki</au><au>Forman, Drew C.</au><au>Ober, Christopher K.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>C60-containing polymers for electron beam lithography</atitle><jtitle>Polymer bulletin (Berlin, Germany)</jtitle><stitle>Polym. Bull</stitle><date>2014</date><risdate>2014</risdate><volume>71</volume><issue>9</issue><spage>2395</spage><epage>2405</epage><pages>2395-2405</pages><issn>0170-0839</issn><eissn>1436-2449</eissn><coden>POBUDR</coden><abstract>New C
60
-containing polymers were synthesized for electron beam lithography. The homo and random copolymers of
p
-chloromethylstyrene and
p
-
tert
-butoxystyrene were produced using a nitroxide-mediated living radical polymerization technique, and then the C
60
-containing polymers were obtained by the reaction of C
60
with the nitroxide-terminated polymers and the subsequent transformation of the
tert
-butoxy groups to hydroxy groups. The highly sensitive lithographic performance of the resulting electron beam resists led to the fabrication of 50-nm-feature size patterning using the C
60
-containing copolymers of
p
-chloromethylstyrene and
p
-hydroxystyrene.</abstract><cop>Berlin/Heidelberg</cop><pub>Springer Berlin Heidelberg</pub><doi>10.1007/s00289-014-1197-z</doi><tpages>11</tpages></addata></record> |
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| ispartof | Polymer bulletin (Berlin, Germany), 2014, Vol.71 (9), p.2395-2405 |
| issn | 0170-0839 1436-2449 |
| language | eng |
| recordid | cdi_proquest_journals_2918035620 |
| source | AUTh Library subscriptions: ProQuest Central; Springer journals; ProQuest Central |
| subjects | Applied sciences Characterization and Evaluation of Materials Chemistry Chemistry and Materials Science Complex Fluids and Microfluidics Copolymers Electron beam lithography Exact sciences and technology Molecular weight Organic Chemistry Organic polymers Original Paper Physical Chemistry Physicochemistry of polymers Polymer Sciences Polymerization Polymers Polymers with particular properties Preparation, kinetics, thermodynamics, mechanism and catalysts Silicon wafers Soft and Granular Matter |
| title | C60-containing polymers for electron beam lithography |
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