Lithographic results of electron beam photoresists prepared by living free radical polymerization

SummaryA new family of random copolymers composed of chloromethylstyrene and a silicon based styrenic monomer was prepared using living radical polymerization. The lithographic efficiency of the resulting electron beam resists was examined. A pronounced improvement on the lithographic resolution and...

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Veröffentlicht in:	Polymer bulletin (Berlin, Germany) Germany), 1999-08, Vol.43 (1), p.93-100
Hauptverfasser:	BIGNOZZI, M. C, OBER, C. K, NOVEMBRE, A. J, KNUREK, C
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Copolymers Electron beams Exact sciences and technology Free radical polymerization Free radicals Image quality Mass distribution Organic polymers Photoresists Physicochemistry of polymers Polymers with particular properties Preparation, kinetics, thermodynamics, mechanism and catalysts Resists
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Beschreibung
Zusammenfassung:	SummaryA new family of random copolymers composed of chloromethylstyrene and a silicon based styrenic monomer was prepared using living radical polymerization. The lithographic efficiency of the resulting electron beam resists was examined. A pronounced improvement on the lithographic resolution and image quality of resists with a narrow molecular mass distribution was observed and is described.
ISSN:	0170-0839 1436-2449
DOI:	10.1007/s002890050538