Advanced CMOS Devices and Applications

Advanced CMOS Devices and Applications

The persistent scaling of transistor dimensions has marked an era characterized by a fourfold increase in transistor density and a twofold boost in electrical performance every 2–3 years, effectively reducing their cost per function [...]

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Bibliographische Detailangaben
Veröffentlicht in:Electronics (Basel) 2024-01, Vol.13 (1), p.134
Hauptverfasser: Lee, Choonghyun, Zhao, Yi
Format: Artikel
Sprache:eng
Schlagworte:
Architecture
CMOS
Design
Designers
Neural networks
Semiconductors
Silicon
Simulation
Thin films
Transistors
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Zusammenfassung:The persistent scaling of transistor dimensions has marked an era characterized by a fourfold increase in transistor density and a twofold boost in electrical performance every 2–3 years, effectively reducing their cost per function [...]
ISSN:2079-9292
2079-9292
DOI:10.3390/electronics13010134