A Modeling Study of Stacked Cu-CNT TSV on Electrical, Thermal, and Reliability Analysis
In this article, we propose a position-oriented carbon nanotube (CNT) sampling method based on the Monte Carlo (MC) concept, which obtains the relative positional distribution and concentration of CNTs, providing an accurate modeling basis. The copper-CNT (Cu-CNT) through-silicon via (TSV) model is...
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Veröffentlicht in: | IEEE transactions on electron devices 2024-01, Vol.71 (1), p.1-8 |
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Sprache: | eng |
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Zusammenfassung: | In this article, we propose a position-oriented carbon nanotube (CNT) sampling method based on the Monte Carlo (MC) concept, which obtains the relative positional distribution and concentration of CNTs, providing an accurate modeling basis. The copper-CNT (Cu-CNT) through-silicon via (TSV) model is established through the transition from the unit level to the circuit level, and the circuit analysis is performed with the TSV pair. We find that Cu-CNT TSVs have better resistivity than Cu TSVs in long-distance transport under the premise of ensuring variability. But CNT does not optimize the crosstalk performance of the composite material, as expected, due to the inhibition of CNTs by Cu in the composite. Cu-CNT well reduces the negative impact of interfacial resistance on delay ( |
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ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/TED.2023.3293780 |