Planar Magnetron with Heated Boron Target for In Situ Investigation of Boron Film Deposition

Planar Magnetron with Heated Boron Target for In Situ Investigation of Boron Film Deposition

Planar magnetrons with a heated crystalline boron target are promising for depositing boron coatings intended for a wide range of scientific and industrial applications. The promotion of this type of magnetrons requires an in-depth investigation of the coating deposition process. A new version of su...

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Veröffentlicht in:Russian physics journal 2023-12, Vol.66 (10), p.1108-1113
Hauptverfasser: Bugaev, A. S., Cherkasov, A. A., Frolova, V. P., Gushenets, V. I., Nikolaev, A. G., Oks, E. M., Savkin, K. P., Shandrikov, M. V., Vizir, A. V.
Format: Artikel
Sprache:eng
Schlagworte:
Boron
Coatings
Condensed Matter Physics
Deposition
Design parameters
Hadrons
Heavy Ions
Industrial applications
Investigations
Lasers
Magnetrons
Mathematical and Computational Physics
Measurement
Nuclear Physics
Optical Devices
Optics
Photonics
Physics
Physics and Astronomy
Plasma Physics
Radiation
Radiation measurement
Synchrotron radiation
Synchrotrons
Theoretical
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Zusammenfassung:Planar magnetrons with a heated crystalline boron target are promising for depositing boron coatings intended for a wide range of scientific and industrial applications. The promotion of this type of magnetrons requires an in-depth investigation of the coating deposition process. A new version of such a magnetron is created for the vacuum electron-ion-plasma (VEIP) test installation for in situ synchrotron radiation monitoring of the boron coating synthesis. The paper proposes the design and parameters for this magnetron and discusses the boron coating deposition using the VEIP test installation.
ISSN:1064-8887
1573-9228
DOI:10.1007/s11182-023-03050-8