MOF Enhanced Dielectric Barrier Discharge Plasma Decomposition of H2S in the Presence of Low Alkanes
There exist always some H 2 S in natural gas. The industrialized process for H 2 S removal is an energy intense process and must be applied in a large scale. An alternative process is needed. Herein, we report a removal of H 2 S from a model natural gas mixture with methane, ethane and propane by di...
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Veröffentlicht in: | Plasma chemistry and plasma processing 2023-11, Vol.43 (6), p.2079-2091 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | There exist always some H
2
S in natural gas. The industrialized process for H
2
S removal is an energy intense process and must be applied in a large scale. An alternative process is needed. Herein, we report a removal of H
2
S from a model natural gas mixture with methane, ethane and propane by dielectric barrier discharge (DBD), with which the dielectric (quartz) is frosted and coated with a layer of zeolite imidazole framework-67 (ZIF-67) nanoparticles. Compared to the DBD without coating, the average electric field as well as the mean electron energy of the DBD with ZIF-67 coating are higher at the same specific energy input (SEI), leading to a high H
2
S conversion of 75.4% with the limited conversion of methane (less than 2%). No conversions of other low alkanes can be detected. This provides a potential way for the H
2
S removal from the natural gas sources in the remote or isolated region.
Graphical abstract |
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ISSN: | 0272-4324 1572-8986 |
DOI: | 10.1007/s11090-023-10401-3 |