MOF Enhanced Dielectric Barrier Discharge Plasma Decomposition of H2S in the Presence of Low Alkanes

There exist always some H 2 S in natural gas. The industrialized process for H 2 S removal is an energy intense process and must be applied in a large scale. An alternative process is needed. Herein, we report a removal of H 2 S from a model natural gas mixture with methane, ethane and propane by di...

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Veröffentlicht in:Plasma chemistry and plasma processing 2023-11, Vol.43 (6), p.2079-2091
Hauptverfasser: Li, Yingwen, Gao, Fei, Li, Yang, Shen, Chenyang, Liu, Chang-jun
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Sprache:eng
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Zusammenfassung:There exist always some H 2 S in natural gas. The industrialized process for H 2 S removal is an energy intense process and must be applied in a large scale. An alternative process is needed. Herein, we report a removal of H 2 S from a model natural gas mixture with methane, ethane and propane by dielectric barrier discharge (DBD), with which the dielectric (quartz) is frosted and coated with a layer of zeolite imidazole framework-67 (ZIF-67) nanoparticles. Compared to the DBD without coating, the average electric field as well as the mean electron energy of the DBD with ZIF-67 coating are higher at the same specific energy input (SEI), leading to a high H 2 S conversion of 75.4% with the limited conversion of methane (less than 2%). No conversions of other low alkanes can be detected. This provides a potential way for the H 2 S removal from the natural gas sources in the remote or isolated region. Graphical abstract
ISSN:0272-4324
1572-8986
DOI:10.1007/s11090-023-10401-3