Passivation of aluminum mirrors with SF6- or NF3-based plasmas
This research compares the use of NF3 and SF6 process gases for the removal of the native oxide from Al mirrors and their subsequent fluorination using low-temperature electron-beam generated plasmas. This single step process produces a stoichiometric AlF3 layer of controllable thickness which provi...
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Veröffentlicht in: | Optical materials express 2023-11, Vol.13 (11), p.3121 |
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Hauptverfasser: | , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | This research compares the use of NF3 and SF6 process gases for the removal of the native oxide from Al mirrors and their subsequent fluorination using low-temperature electron-beam generated plasmas. This single step process produces a stoichiometric AlF3 layer of controllable thickness which provides an excellent passivation layer for Al mirrors for far-ultraviolet optics applications. We show that NF3 produces more atomic F content within the plasma than SF6 for similar process conditions, allowing faster oxide removal and fluoride film growth. Al mirrors passivated in either SF6 or NF3 were subsequently studied as a function of gas flow concentration. We found that above a threshold value of atomic F content in the plasma (≈2 × 1018 m−3) samples processed with SF6 or NF3 exhibit similar optical and structural properties regardless of process parameters. |
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ISSN: | 2159-3930 |
DOI: | 10.1364/OME.499273 |