Examining the Summertime Ozone Formation Regime in Southeast Michigan Using MOOSE Ground‐Based HCHO/NO2 Measurements and F0AM Box Model
Ambient ozone (O3) concentrations in Southeast Michigan (SEMI) can exceed the U.S. National Ambient Air Quality Standard. Despite past efforts to measure O3 precursors and elucidate reaction mechanisms, changing emission patterns and atmospheric composition in SEMI warrant new measurements and updat...
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Veröffentlicht in: | Journal of geophysical research. Atmospheres 2023-10, Vol.128 (19) |
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Sprache: | eng |
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Zusammenfassung: | Ambient ozone (O3) concentrations in Southeast Michigan (SEMI) can exceed the U.S. National Ambient Air Quality Standard. Despite past efforts to measure O3 precursors and elucidate reaction mechanisms, changing emission patterns and atmospheric composition in SEMI warrant new measurements and updated mechanisms to understand the causes of observed O3 exceedances. In this study, we examine the chemical drivers of O3 exceedances in SEMI, based on the Phase I MOOSE (Michigan‐Ontario Ozone Source Experiment) field study performed during May to June 2021. A zero‐dimensional (0‐D) box model is constrained with measurement data of meteorology and trace gas concentrations. Box model sensitivity simulations suggest that the formaldehyde to nitrogen dioxide ratio (HCHO/NO2) for the transition between the volatile organic compounds (VOCs)‐ and nitrogen oxides (NOx)‐limited O3 production regimes is 3.0 ± 0.3 in SEMI. The midday (12:00–16:00) averaged HCHO/NO2 ratio during the MOOSE Phase I study is 1.62 ± 1.03, suggesting that O3 production in SEMI is limited by VOC emissions. This finding implies that imposing stricter regulations on VOC emissions should be prioritized for the SEMI O3 nonattainment area. This study, through its use of ground‐based HCHO/NO2 ratios and box modeling to assess O3‐VOC‐NOx sensitivities, has significant implications for air quality policy and the design of effective O3 pollution control strategies, especially in O3 nonattainment areas. |
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ISSN: | 2169-897X 2169-8996 |
DOI: | 10.1029/2023JD038943 |